Evacuated Periotic Structures and Methods of Manufacturing

ABSTRACT

Improvements to gratings for use in waveguides and methods of producing them are described herein. Deep surface relief gratings (SRGs) may offer many advantages over conventional SRGs, an important one being a higher S-diffraction efficiency. In one embodiment, deep SRGs can be implemented as polymer surface relief gratings or evacuated periodic structures (EPSs). EPSs can be formed by first recording a holographic polymer dispersed liquid crystal (HPDLC) periodic structure. Removing the liquid crystal from the cured periodic structure provides a polymer surface relief grating. Polymer surface relief gratings have many applications including for use in waveguide-based displays.

CROSS-REFERENCED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.17/653,818, filed Mar. 7, 2022, which claims priority to U.S.Provisional Application 63/157,467 filed on Mar. 5, 2021, U.S.Provisional Application 63/174,401 filed on Apr. 13, 2021, and U.S.Provisional Application 63/223,311 filed on Jul. 19, 2021, thedisclosures of which are incorporated by reference in their entirety.

FIELD OF THE DISCLOSURE

The present invention generally relates to waveguides and methods forfabricating waveguides and more specifically to waveguide displayscontaining gratings formed in a multi-component mixture from which onematerial component is removed and methods for fabricating said gratings.

BACKGROUND

Waveguides can be referred to as structures with the capability ofconfining and guiding waves (i.e., restricting the spatial region inwhich waves can propagate). One subclass includes optical waveguides,which are structures that can guide electromagnetic waves, typicallythose in the visible spectrum. Waveguide structures can be designed tocontrol the propagation path of waves using a number of differentmechanisms. For example, planar waveguides can be designed to utilizediffraction gratings to diffract and couple incident light into thewaveguide structure such that the in-coupled light can proceed to travelwithin the planar structure via total internal reflection (TIR).

Fabrication of waveguides can include the use of material systems thatallow for the recording of holographic optical elements within or on thesurface of the waveguides. One class of such material includes polymerdispersed liquid crystal (PDLC) mixtures, which are mixtures containingphotopolymerizable monomers and liquid crystals. A further subclass ofsuch mixtures includes holographic polymer dispersed liquid crystal(HPDLC) mixtures. Holographic optical elements, such as volume phasegratings, can be recorded in such a liquid mixture by illuminating thematerial with two mutually coherent laser beams. During the recordingprocess, the monomers polymerize, and the mixture undergoes aphotopolymerization-induced phase separation, creating regions denselypopulated by liquid crystal (LC) micro-droplets, interspersed withregions of clear polymer. The alternating liquid crystal-rich and liquidcrystal-depleted regions form the fringe planes of the grating.

Waveguide optics, such as those described above, can be considered for arange of display and sensor applications. In many applications,waveguides containing one or more grating layers encoding multipleoptical functions can be realized using various waveguide architecturesand material systems, enabling new innovations in near-eye displays forAugmented Reality (AR) and Virtual Reality (VR), compact Heads UpDisplays (HUDs) for aviation and road transport, and sensors forbiometric and laser radar (LIDAR) applications. As many of theseapplications are directed at consumer products, there is a growingrequirement for efficient low cost means for manufacturing holographicwaveguides in large volumes.

SUMMARY OF THE DISCLOSURE

Many embodiments are directed to polymer grating structures, theirdesign, methods of manufacture, and materials.

Various embodiments are directed to a method for fabricating a periodicstructure, the method including: providing a holographic mixture on abase substrate; sandwiching the holographic mixture between the basesubstrate and a cover substrate, where the holographic mixture forms aholographic mixture layer on the base substrate; applying holographicrecording beams to the holographic mixture layer to form a holographicpolymer dispersed liquid crystal periodic structure comprisingalternating polymer rich regions and liquid crystal rich regions; andremoving the cover substrate from the holographic polymer dispersedliquid crystal periodic structure, wherein the cover substrate hasdifferent properties than the base substrate to allow for the coversubstrate to adhere to the unexposed holographic mixture layer whilecapable of being removed from the formed holographic polymer dispersedliquid crystal periodic structure after exposure.

Further, various embodiments are directed to a method for fabricatingperiodic structures, the method including: providing a first holographicmixture on a first base substrate; sandwiching the first holographicmixture between the first base substrate and a cover substrate, wherethe first holographic mixture forms a first holographic mixture layer onthe first base substrate; applying holographic recording beams to thefirst holographic mixture layer to form a first holographic polymerdispersed liquid crystal periodic structure comprising alternatingpolymer rich regions and liquid crystal rich regions; removing the coversubstrate from the holographic polymer dispersed liquid crystal periodicstructure; providing a second holographic mixture on a second basesubstrate; sandwiching the second holographic mixture between the secondbase substrate and the cover substrate, wherein the second holographicmixture forms a second holographic mixture layer on the second basesubstrate; and applying holographic recording beams to the secondholographic mixture layer to form a second holographic polymer dispersedliquid crystal periodic structure comprising alternating polymer richregions and liquid crystal rich regions.

Further, various embodiments are directed to a device for fabricating adeep surface relief grating (SRG) including: a holographic mixturesandwiched between a base substrate and a cover substrate, where theholographic mixture is configured to form a holographic polymerdispersed liquid crystal grating comprising alternating polymer richregions and liquid crystal rich regions when exposed to holographicrecording beams, and where the base substrate and the cover substratehave different properties to allow the cover substrate to adhere to theunexposed holographic mixture layer while capable of being removed fromthe formed holographic polymer dispersed liquid crystal grating afterexposure.

Further, various embodiments are directed to a waveguide deviceincluding: a waveguide supporting a polymer grating structure fordiffracting light propagating in total internal reflection in saidwaveguide, where the polymer grating structure includes: a polymerregions; air gaps between adjacent portions of the polymer regions; anda coating disposed on the tops of the polymer regions and the tops ofthe waveguide.

Further, various embodiments are directed to a waveguide deviceincluding: a waveguide supporting a polymer grating structure fordiffracting light propagating in total internal reflection in saidwaveguide, where the polymer grating structure includes: a polymerregions; air gaps between adjacent portions of the polymer regions; anoptical layer disposed between the polymer regions and the waveguide;and a coating disposed on the tops of the polymer regions and the topsof the optical layer.

Further, various embodiments are directed to a waveguide deviceincluding: a waveguide supporting a polymer grating structure fordiffracting light propagating in total internal reflection in saidwaveguide, where the polymer grating structure includes: a polymerregions; air gaps between adjacent portions of the polymer regions; andan optical layer disposed between the polymer regions and the waveguide.

Further, various embodiments are directed to a waveguide deviceincluding: a waveguide supporting a polymer grating structure fordiffracting light propagating in total internal reflection in saidwaveguide, where the polymer grating structure includes: a polymerregions; and air gaps between adjacent portions of the polymer regions,where the polymer regions and air gaps directly contact the waveguide.

Further, various embodiments are directed to a method for fabricating agrating, the method including: providing a mixture of monomer and anonreactive material; providing a substrate; coating a layer of themixture on a surface of the substrate; applying holographic recordingbeams to the layer to form a holographic polymer dispersed gratingincluding alternating polymer rich regions and nonreactive material richregions; removing at least a portion of the nonreactive material in thenonreactive material rich regions to form a polymer surface reliefgrating including alternating polymer regions and air regions; andapplying a coating to the top surfaces of the polymer regions and thetop surfaces of the substrate in the air regions.

Further, various embodiments are directed to a method for fabricating agrating, the method including: providing a mixture of monomer and anonreactive material; providing a substrate; coating a layer of themixture on a surface of the substrate; applying holographic recordingbeams to the layer to form a holographic polymer dispersed gratingincluding alternating polymer rich regions and nonreactive material richregions; removing at least a portion of the nonreactive material in thenonreactive material rich regions to form a polymer surface reliefgrating including alternating polymer regions and air regions, whereinan optical layer is disposed between the polymer regions and thesubstrate; and applying a coating to the top surfaces of the polymerregions and the top surfaces of the optical layer in the air regions.

Further, various embodiments are directed to a method for fabricating agrating, the method including: providing a mixture of monomer and anonreactive material; providing a substrate; coating a layer of themixture on a surface of the substrate; applying holographic recordingbeams to the layer to form a holographic polymer dispersed gratingincluding alternating polymer rich regions and nonreactive material richregions; removing at least a portion of the nonreactive material in thenonreactive material rich regions to form a polymer surface reliefgrating including alternating polymer regions and air regions; andperforming a plasma ashing process to remove at least a portion ofpolymer from the polymer regions.

BRIEF DESCRIPTION OF THE DRAWINGS

The description will be more fully understood with reference to thefollowing figures and data graphs, which are presented as exemplaryembodiments of the invention and should not be construed as a completerecitation of the scope of the invention.

FIG. 1A conceptually illustrates a step of a method for fabricating asurface relief grating in which a mixture of monomer and liquid crystaldeposited on a transparent substrate is exposed to holographic exposurebeams in accordance with an embodiment of the invention.

FIG. 1B conceptually illustrates a step of a method for fabricating asurface relief grating from an HPDLC grating formed on a transparentsubstrate in accordance with an embodiment of the invention.

FIG. 1C conceptually illustrates a step of a method for fabricating asurface relief grating in which liquid crystal is removed from an HPDLCgrating to form a polymer surface relief grating in accordance with anembodiment of the invention.

FIG. 1D conceptually illustrates a step of a method for covering asurface relief grating with a protective layer in accordance with anembodiment of the invention.

FIG. 2 is a flow chart conceptually illustrating a method for forming apolymer surface relief grating from an HPDLC grating formed on atransparent substrate in accordance with an embodiment of the invention.

FIG. 3A is an example implementation of a polymer surface relief gratingor evacuated periodic structure.

FIG. 3B illustrates a cross sectional schematic view of a polymer-airperiodic structure 3000 a in accordance with an embodiment of theinvention.

FIG. 3C is a graph illustrating the effect of optical layer thickness onthe diffraction efficiency versus incident angle.

FIG. 4A conceptually illustrates a step of a method for fabricating asurface relief grating in which a mixture of monomer and liquid crystaldeposited on a transparent substrate is exposed to holographic exposurebeams in accordance with an embodiment of the invention.

FIG. 4B conceptually illustrates a step of a method for fabricating asurface relief grating from an HPDLC periodic structure formed on atransparent substrate in accordance with an embodiment of the invention.

FIG. 4C conceptually illustrates a step of a method for fabricating asurface relief grating in which liquid crystal is removed from an HPDLCperiodic structure to form a polymer surface relief grating inaccordance with an embodiment of the invention.

FIG. 4D conceptually illustrates a step of a method for fabricating asurface relief grating in which the surface relief grating is partiallyrefilled with liquid crystal to form a hybrid surface relief-periodicstructure in accordance with an embodiment of the invention.

FIG. 4E conceptually illustrates a step of a method for fabricating asurface relief grating in which a hybrid surface relief-periodicstructure is covered with a protective layer in accordance with anembodiment of the invention.

FIG. 5 is a flow chart conceptually illustrating a method for forming ahybrid surface relief-periodic structure in accordance with anembodiment of the invention.

FIG. 6 is a graph showing calculated P-polarized and S-polarizeddiffraction efficiency versus incidence angle for a 1-micrometerthickness deep surface relief grating in accordance with an embodimentof the invention.

FIG. 7 is a graph showing calculated P-polarized and S-polarizeddiffraction efficiency versus incidence angle for a 2-micrometerthickness deep surface relief grating in accordance with an embodimentof the invention.

FIG. 8 is a graph showing calculated P-polarized and S-polarizeddiffraction efficiency versus incidence angle for a 3-micrometerthickness deep surface relief grating in accordance with an embodimentof the invention.

FIGS. 9A and 9B illustrate scanning electron microscope images ofmultiple embodiments including different thiol concentrations.

FIGS. 10A and 10B are images comparing an HPDLC periodic structure and apolymer surface relief grating or evacuated periodic structure.

FIGS. 11A and 11B are two plots comparing an HPDLC periodic structureand a polymer surface relief grating or evacuated periodic structure.

FIGS. 12A and 12B are two plots of S-diffraction efficiency andP-diffraction efficiency of two example polymer surface relief gratingswith different depths.

FIGS. 13A and 13B are two different plots of S-diffraction efficiencyand P-diffraction efficiency of various example polymer surface reliefgratings produced with different initial liquid crystal concentrations.

FIGS. 14A and 14B are two different plots of S-diffraction efficiencyand P-diffraction efficiency of various example polymer surface reliefgratings produced with different initial liquid crystal concentrations.

FIG. 15 is a graph of diffraction efficiency versus grating layerthickness showing the dependence of evanescent coupling on the gratinglayer thickness.

FIGS. 16A-16G illustrate various stages of manufacture of a surfacerelief grating implementing a cover substrate in accordance with anembodiment of the invention.

FIG. 17 illustrates an example reaction forming a holographic mixturelayer in accordance with an embodiment of the invention.

FIG. 18 illustrates a reaction between reagents and a base substrate inaccordance with an embodiment of the invention.

FIG. 19 illustrates a reaction between release material and a coversubstrate in accordance with an embodiment of the invention.

FIGS. 20A and 20B illustrate various grating in accordance with anembodiment of the invention.

FIG. 20C illustrates a grating in accordance with an embodiment of theinvention.

FIGS. 21A-21C conceptually illustrate three embodiments of waveguides inwhich evanescent coupling into a grating can occur.

FIGS. 22A-22D illustrate various stages of manufacturing an inversegrating in accordance with an embodiment of the invention.

FIG. 23A illustrates a schematic representation of a grating inaccordance with an embodiment of the invention.

FIG. 23B illustrates a schematic representation of a grating inaccordance with an embodiment of the invention.

FIG. 23C illustrates a schematic representation of a grating inaccordance with an embodiment of the invention.

FIG. 24 illustrates an example process flow for fabricating SRGs inaccordance with an embodiment of the invention.

FIGS. 25A and 25B illustrate the principles of a dual interactiongrating for implementation in a waveguide.

FIG. 26 conceptually illustrates a cross section of a grating inaccordance with an embodiment of the invention.

FIG. 27 is a conceptual representation of beam propagation with thegrating of FIG. 26.

FIG. 28 illustrates an example of a partially backfilled grating inaccordance with an embodiment of the invention.

FIG. 29 schematically illustrates a ray-grating interaction geometry ofa TIR surface grating.

FIG. 30 conceptually illustrates a waveguide display in accordance withan embodiment of the invention.

FIG. 31 conceptually illustrates a waveguide display having twoair-spaced waveguide layers in accordance with an embodiment of theinvention.

FIG. 32 conceptually illustrates typical ray paths for a waveguidedisplay in accordance with an embodiment of the invention.

FIG. 33 conceptually illustrates a waveguide display in which thewaveguide supports a curved optical surface in accordance with anembodiment of the invention.

FIG. 34 conceptually illustrates a waveguide display in which thewaveguide supports upper and lower curved optical surfaces in accordancewith an embodiment of the invention.

FIG. 35 conceptually illustrates a waveguide display in which thewaveguide supports a curved optical surface and an input image isprovided using a pixel array predistorted to compensate for aberrationsintroduced by the curved optical surface in accordance with anembodiment of the invention.

FIG. 36 conceptually illustrates a waveguide display in which thewaveguide supports a curved optical surface and an input image isprovided using a pixel array supported by a curved substrate andpredistorted to compensate for aberrations introduced by the curvedoptical surface in accordance with an embodiment of the invention.

FIG. 37 is a flow chart conceptually illustrating a method forprojecting image light for view using a waveguide containingS-diffracting and P-diffracting gratings in accordance with anembodiment of the invention.

FIG. 38 is a flow chart conceptually illustrating a method forprojecting image light for view using a waveguide supporting an opticalprescription surface and containing S-diffracting and P-diffractinggratings in accordance with an embodiment of the invention.

FIG. 39A conceptually illustrates a portion of a pixel pattern havingrectangular elements of differing size and aspect ratio for use in anemissive display panel in accordance with an embodiment of theinvention.

FIG. 39B conceptually illustrates a portion of a pixel pattern havingPenrose tiles for use in an emissive display panel in accordance with anembodiment of the invention.

FIG. 39C conceptually illustrates a portion of a pixel pattern havinghexagonal elements for use in an emissive display panel in accordancewith an embodiment of the invention.

FIG. 39D conceptually illustrates a portion of a pixel pattern havingsquare elements for use in an emissive display panel in accordance withan embodiment of the invention.

FIG. 39E conceptually illustrates a portion of a pixel pattern havingdiamond-shaped elements for use in an emissive display panel inaccordance with an embodiment of the invention.

FIG. 39F conceptually illustrates a portion of a pixel pattern havingisosceles triangular elements for use in an emissive display panel inaccordance with an embodiment of the invention.

FIG. 39G conceptually illustrates a portion of a pixel pattern havinghexagonal elements with horizontally biased aspect ratios for use in anemissive display panel in accordance with an embodiment of theinvention.

FIG. 39H conceptually illustrates a portion of a pixel pattern havingrectangular elements with horizontally biased aspect ratios for use inan emissive display panel in accordance with an embodiment of theinvention.

FIG. 39I conceptually illustrates a portion of a pixel pattern havingdiamond shaped elements with horizontally biased aspect ratios for usein an emissive display panel in accordance with an embodiment of theinvention.

FIG. 39J conceptually illustrates a portion of a pixel pattern havingtriangles with horizontally biased aspect ratios for use in an emissivedisplay panel in accordance with an embodiment of the invention.

FIG. 40 conceptually illustrates a portion of a pixel pattern havingdiamond shaped elements in which different pixels can have differentemission characteristics in accordance with an embodiment of theinvention.

DETAILED DESCRIPTION

There is a growing interest in the use of various periodic structure(e.g. gratings) on waveguides in order to provide a variety offunctions. These periodic structure may include angle multiplexedgratings, color multiplexed gratings, fold gratings, dual interactiongratings, rolled K-vector gratings, crossed fold gratings, tessellatedgratings, chirped gratings, gratings with spatially varying refractiveindex modulation, gratings having spatially varying grating thickness,gratings having spatially varying average refractive index, gratingswith spatially varying refractive index modulation tensors, and gratingshaving spatially varying average refractive index tensors. In specificexamples, gratings for diffraction of various polarizations of light(e.g. S-polarized light and P-polarized light) may be beneficial. Itwould be specifically advantageous to have a grating which diffractseither S-polarized light or P-polarized light. Specific applications forthis technology include waveguide-based displays such as augmentedreality displays and virtual reality displays. One example is inputgratings which may be used to input one or both of S-polarized light orP-polarized light into the waveguide. However, in many cases, it wouldbe advantageous to have a grating which diffracts either S-polarizedlight and P-polarized light. For example, waveguide displays usingunpolarized light sources such as OLED light sources produce bothS-polarized and P-polarized light and thus it would be advantageous tohave gratings which can diffract both S-polarized and P-polarized light.

One specific class of gratings includes surface relief gratings (SRGs)which may be used to diffract either P-polarized light or S-polarizedlight. Another class of gratings are surface relief gratings (SRGs)which are normally P-polarization selective, leading to a 50% efficiencyloss with unpolarized light sources such as organic light emittingdiodes (OLEDs) and light emitting diodes (LEDs). Combining a mixture ofS-polarization diffracting and P-polarization diffracting gratings mayprovide a theoretical 2× improvement over waveguides using P-diffractinggratings only. Thus, it would be advantageous to have a high efficiencyS-polarization diffraction grating. In many embodiments, anS-polarization diffracting grating can be provided by a periodicstructure formed in a holographic photopolymer. One periodic structureincludes a grating such as a Bragg grating. In some embodiments, anS-polarization diffracting grating can be provided by a periodicstructure formed in a holographic polymer dispersed liquid crystal(HPDLC) with birefringence altered using an alignment layer or otherprocesses for realigning the liquid crystal (LC) directors. In severalembodiments, an S-polarization diffracting periodic structure can beformed using liquid crystals, monomers, and other additives thatnaturally organize into S-diffracting periodic structures under phaseseparation. In some embodiments, these HPDLC periodic structures mayform deep SRGs which have superior S-polarization diffractionefficiency.

One class of deep SRGs are polymer-air SRGs or evacuated periodicstructure (EPSs) which may exhibit high S-diffraction efficiency (up to99%) and low P-diffraction efficiency and may be implemented as inputgratings for waveguides. The EPSs may be evacuated Bragg gratings(EBGs). Such periodic structures can be formed by removing the liquidcrystal from HPDLC periodic structures formed from holographic phaseseparation of a liquid crystal and monomer mixture. Deep SRGs formed bysuch a process typically have a thickness in the range 1-3 micrometerswith a fringe spacing 0.35 to 0.80 micrometers. In some embodiments, theratio of grating depth to fringe spacing may be 1:1 to 5:1. As canreadily be appreciated, such gratings can be formed with differentdimensions depending on the specific requirements of the givenapplication. Examples of how the thickness of SRGs may yield differentresultant diffraction efficiencies are described in connection withFIGS. 6-8.

In many embodiments, the condition for a deep SRGs is characterized by ahigh grating depth to fringe spacing ratio. In some embodiments, thecondition for the formation of a deep SRGs is that the grating depth isapproximately twice the grating period. Modelling such deep SRGs usingthe Kogelnik theory can give reasonably accurate estimates ofdiffraction efficiency, avoiding the need for more advanced modelling,which typically entails the numerical solution of Maxwell's equations.The grating depths that can be achieved using liquid crystal removalfrom HPDLC periodic structures greatly surpass those possible usingconventional nanoimprint lithographic methods, which cannot achieve theconditions for deep SRGs (typically providing only 250-300 nm depth forgrating periods 350-460 nm). (Pekka Äyräs, Pasi Saarikko, Tapani Levola,“Exit pupil expander with a large field of view based on diffractiveoptics”, Journal of the SID 17/8, (2009), pp 659-664). It should beemphasized here that, although the S-polarization diffracting deep SRGsare emphasized within the present application, deep SRGs can, as will bediscussed below, provide a range of polarization responsecharacteristics depending on the thickness of the grating prescriptionand, in particular, the grating depth. As such, deep SRGs can beimplemented in a variety of different applications.

The literature supports equivalence of deep SRGs and periodicstructures. One reference (Kiyoshi Yokomori, “Dielectric surface-reliefgratings with high diffraction efficiency” Applied Optics; Vol. 23;Issue 14; (1984); pp. 2303-2310), discloses the investigation of thediffraction properties of dielectric surface-relief gratings by solvingMaxwell's equations numerically. The diffraction efficiency of a gratingwith a groove depth about twice as deep as the grating period was foundto be comparable with the efficiency of a volume phase grating. Themodelling by Yokomori predicted that dielectric surface-relief gratingsinterferometrically recorded in photoresist can possess a highdiffraction efficiency of up to 94% (throughput efficiency 85%). Theequivalence of deep SRGs and periodic structures is also discussed inanother article by Golub (M. A. Golub, A. A. Friesem, L. Eisen “Braggproperties of efficient surface relief gratings in the resonancedomain”, Optics Communications; 235; (2004); pp 261-267). A furtherarticle by Gerritsen discusses the formation of Bragg-like SRGs inphotoresist (Gerritsen H J, Thornton D K, Bolton S R; “Application ofKogelnik's two-wave theory to deep, slanted, highly efficient, relieftransmission gratings” Applied Optics; Vol. 30; Issue 7; (1991); pp807-814).

Many embodiments of this disclosure provide for methods of making SRGssuch as deep SRGs that can offer very significant advantages overnanoimprint lithographic process particularly for slanted gratings.Periodic structures of any complexity can be made using interference ormaster and contact copy replication. In some embodiments, after removingthe LC, the SRGs can be back filled with a material with differentproperties to the LC. This allows a periodic structure with modulationproperties that are not limited by the grating chemistry needed forgrating formation.

In some embodiments the backfill material may not be a LC material. Insome embodiments, the backfill material may have a higher index ofrefraction than air which may increase the angular bandwidth of awaveguide. In several embodiments, the deep SRGs can be partiallybackfilled with LC to provide a hybrid SRG/periodic structure.Alternatively, in some embodiments, the refill step can be avoided byremoving just a portion of the LC from the LC rich regions of the HPDLCto provide a hybrid SRG/periodic structure. The refill approach has theadvantage that a different LC can be used to form the hybrid periodicstructures. The materials can be deposited using an inkjet depositionprocess.

In some embodiments, the methods described herein may be used to createphotonic crystals. Photonic crystals may be implemented to create a widevariety of diffracting structures including periodic structures such asBragg gratings. Periodic structures may be used as diffraction gratingsto provide functionality including but not limited to input gratings,output gratings, beam expansion gratings, diffract more than one primarycolor. A photonic crystal can be a three-dimensional lattice structurethat can have diffractive capabilities not achievable with a basicperiodic structures. Photonic crystals can include many structuresincluding all 2-D and 3-D Bravais lattices. Recording of such structuresmay benefit from more than two recording beams.

In some embodiments, waveguides incorporating photonic crystals can bearranged in stacks of waveguides, each having a grating prescription fordiffracting a unique spectral bandwidth. In many embodiments, a photoniccrystal formed by liquid crystal extraction provide a deep SRG. In manyembodiments, a deep SRG formed using a liquid crystal extraction processcan typically have a thickness in the range 1-3 micron with a fringespacing 0.35 micron to 0.80 micron. The fringe spacing may be a Braggfringe spacing. In many embodiments, the condition for a deep SRG ischaracterized by a high grating depth to fringe spacing ratio. In someembodiments the condition for the formation of a deep SRG is that thegrating depth can be approximately twice the grating period. It shouldbe emphasized here that, although S-polarization diffracting deep SRGsare described in the present application, deep SRGs can, as will bediscussed below, provide a range of polarization responsecharacteristics depending on the thickness of the grating prescriptionand, in particular, the grating depth. Deep SRGs can also be used inconjunction with conventional Bragg gratings to enhance the color,uniformity and other properties of waveguide displays.

Deep SRGs have been fabricated in glassy monomeric azobenzene materialsusing laser holographic exposure (O. Sakhno, L. M. Goldenberg, M.Wegener, J. Stumpe, “Deep surface relief grating inazobenzene-containing materials using a low intensity 532 nm laser”,Optical Materials: X, 1, (2019), 100006, pp 3-7. The Sakhno referencealso discloses how SRGs can be recorded in a holographic photopolymerusing two linearly orthogonally polarized laser beams.

The disclosure provides a method for making a surface relief gratingthat can offer very significant advantages over nanoimprint lithographicprocess particularly for slanted gratings. Periodic structures of anycomplexity can be made using interference or master and contact copyreplication. In some embodiments after removing the LC the SRG can beback filled with a material with different properties to the LC. Thisallows a periodic structure with modulation properties that are notlimited by the grating chemistry needed for grating formation. In someembodiments the SRGs can be partially backfilled with LC to provide ahybrid SRG/periodic structure. Alternatively, in some embodiments, therefill step can be avoided by removing just a portion of the LC from theLC rich regions of the HPDLC to provide a hybrid SRG/periodic structure.The refill approach has the advantage that a different LC can be used toform the hybrid grating. The materials can be deposited using an inkjetprocess. In some embodiments, the refill material may have a higherindex of refraction than air which may increase diffraction efficiencyof the periodic structure.

While this disclosure has been made in the context of fabricating deepSRGs, it is appreciated that many other grating structures may beproduced using the techniques described herein. For example, any type ofSRG including SRGs in which the grating depth is smaller than thegrating frequency (e.g. Raman-Nath gratings) may be fabricated as well.

FIGS. 1A-1D illustrate a processing apparatus that can be used in amethod for fabricating deep SRGs or EPSs in accordance with anembodiment. FIG. 1A conceptually illustrates an apparatus 190A that canbe used in a step of a method for fabricating a surface relief gratingin which a mixture 191 of monomer and liquid crystal deposited on atransparent substrate 192 is exposed to holographic exposure beams193,194, in accordance with an embodiment of the invention. Theholographic exposure beams 193,194 may be deep UV beams. In someexamples, the mixture 191 may also include at least one of aphotoinitiator, a coinitiator, a multifunctional thiol, adhesionpromoter, surfactant, and/or additional additives.

The mixture 191 may include nanoparticles. The mixture 191 may includephotoacids. The mixture 191 may be a monomer diluted with a non-reactivepolymer. The mixture 191 may include more than one monomer. In someembodiments, the monomer may be isocyanate-acrylate based or thiolenebased. In some embodiments, the liquid crystal may be a full liquidcrystal mixture or a liquid crystal single. A liquid crystal single mayonly include a portion of a full liquid crystal mixture. Variousexamples, liquid crystal singles may include one or all ofcyanobiphenyls, alkyl, alkoxy, cyanobiphenyls, and/or terphenyls. Theliquid crystal mixture may be a cholesteric liquid crystal. The liquidcrystal mixture may include chiral dopants which may control the gratingperiod. The liquid crystal mixture may include photo-responsive and/orhalogen bonded liquid crystals. In some embodiments, liquid crystal maybe replaced with another substance that phase separates with the monomerduring exposure to create polymer rich regions and substance richregions. Advantageously, the substance and liquid crystal singles may bea cost-effective substitute to full liquid crystal mixtures which areremoved at a later step as described below.

In some embodiments, the liquid crystal in the mixture 191 may have adifferent between an extraordinary refractive index and an ordinaryrefractive index of less than 0.01. In some embodiments, the liquidcrystal in the mixture 191 may have a different between an extraordinaryrefractive index and an ordinary refractive index of less than 0.025. Insome embodiments, the liquid crystal in the mixture 191 may have adifferent between an extraordinary refractive index and an ordinaryrefractive index of less than 0.05.

FIG. 1B conceptually illustrates an apparatus 190B that can be used in astep of a method for fabricating a surface relief grating from an HPDLCBragg grating 195 formed on a transparent substrate using theholographic exposure beams, in accordance with an embodiment of theinvention. The holographic exposure beams may transform the monomer intoa polymer in some areas. The holographic exposure beams may includeintersecting recording beams and include alternating bright and darkillumination regions. A polymerization-driven diffusion process maycause the diffusion of monomers and LC in opposite directions, with themonomers undergoing gelation to form polymer-rich regions (in the brightregions) and the liquid crystal becoming trapped in a polymer matrix toform liquid crystal rich regions (in the dark regions).

FIG. 1C conceptually illustrates an apparatus 190C that can be used in astep of a method for fabricating a deep polymer surface relief grating196 or EPS in which liquid crystal is removed from an HPDLC periodicstructure of FIG. 1B to form a polymer surface relief grating inaccordance with an embodiment of the invention. Advantageously, apolymer surface relief grating 196 may include a large depth with acomparatively small grating period in order to form a deep SRG. Theliquid crystal may be removed by washing with a solvent such asisopropyl alcohol (IPA). The solvent may be strong enough to wash awaythe liquid crystal but weak enough to maintain the polymer. In someembodiments, the solvent may be chilled below room temperature beforewashing the grating. FIG. 1D conceptually illustrates an apparatus 190Dthat can be used in a step of a method for fabricating a polymer surfacerelief grating in which the polymer surface relief grating is coveredwith a protective layer 197 in accordance with an embodiment of theinvention.

FIG. 2 conceptually illustrates a method for forming deep SRGs from aHPDLC periodic structure formed on a transparent substrate in accordancewith an embodiment of the invention. As shown, a method 200 of formingdeep SRGs or EPSs is provided. Referring to the flow diagram, the method200 includes providing (201) a mixture of at least one monomer and atleast one liquid crystal. The at least one monomer may include anisocyanate-acrylate monomer or thiolene. For example, the mixture mayinclude a liquid crystal and a thiolene based photopolymer. In someembodiments, the mixture may include a liquid crystal and anacrylate-based photopolymer. In some embodiments, the at least oneliquid crystal may be a full liquid crystal mixture or may be a liquidcrystal single which may include only a portion of the liquid crystalmixture such as a single component of the liquid crystal mixture. Insome embodiments, the at least one liquid crystal may be substituted fora solution which phase separates with the monomer during exposure. Thecriteria for such a solution may include ability to phase separate withthe monomer during exposure, ease of removal after curing and duringwashing, and ease of handing. Example substitute solutions includesolvents, non-reactive monomers, inorganics, and nanoparticles.

Providing the mixture of the monomer and the liquid crystal may alsoinclude mixing one or more of the following with the at least onemonomer and the liquid crystal: initiators such as photoinitiators orcoinitiators, multifunctional thiol, dye, adhesion promoters,surfactants, and/or additional additives such as other cross linkingagents. This mixture may be allowed to rest in order to allow thecoinitiator to catalyze a reaction between the monomer and the thiol.The rest period may occur in a dark space or a space with red light(e.g. infrared light) at a cold temperature (e.g. 20° C.) for a periodof approximately 8 hours. After resting, additional monomers may bemixed into the monomer. This mixture may be then strained or filteredthrough a filter with a small pore size (e.g. 0.45 μm pore size). Afterstraining, this mixture may be stored at room temperature in a darkspace or a space with red light before coating.

Next, a transparent substrate can be provided (202). In certainembodiments, the transparent substrate may be a glass substrate or aplastic substrate. In some embodiments, the transparent substrate may bea flexible substrate to facilitate roll to roll processing. In someembodiments, the EPS may be manufactured on a flexible substrate througha roll to roll process and then peeled off and adhered to a rigidsubstrate. In some embodiments, the EPS may be manufactured on aflexible substrate and a second flexible release layer may be peeled offand discarded which would leave the EPS on a flexible layer. Theflexible layer may be then bonded to another rigid substrate.

A layer of the mixture can be deposited or coated (203) onto a surfaceof the substrate. The layer of mixture may be deposited using inkjetprinting. In some embodiments, the mixture is sandwiched between thetransparent substrate and another substrate using glass spacers tomaintain internal dimensions. A non-stick coating may be applied to theother substrate before the mixture is sandwiched. The non-stick coatingmay include a fluoropolymer such as OPTOOL UD509 (produced by DaikinChemicals), Dow Corning 2634, Fluoropel (produced by Cytonix), and EC200(produced by PPG Industries, Inc). Holographic recording beams can beapplied (204) to the mixture layer. holographic recording beams may be atwo-beam interference pattern which may cause phase separation of the LCand the polymer. In response to the holographic recording beam, theliquid monomer changes to a solid polymer whereas the neutral,non-reactive substance (e.g. LC) diffuses during holographic exposure inresponse to a change in chemical potential driven by polymerization.While LC may be one implementation of the neutral, non-reactivesubstance, other substances may also be used. The substance and themonomer may form a miscible mixture prior to the holographic exposureand become immiscible upon holographic exposure.

After applying the holographic recording beams, the mixture may becured. The curing process may include leaving the mixture underlow-intensity white light for a period of time until the mixture fullycures. The low intensity white light may also cause a photo-bleach dyeprocess to occur. Thus, a HPDLC periodic structure having alternatingpolymer rich and liquid crystal rich regions can be formed (205). Insome embodiments, the curing process may occur in two hours or less.After curing, one of the substrates may be removed exposing the HPDLCperiodic structure. Advantageously, the non-stick coating may allow theother substrate to be removed while the HPDLC periodic structureremaining.

HPDLC periodic structure may include alternating sections of liquidcrystal rich regions and polymer regions. The liquid crystal in theliquid crystal rich regions can be removed (206) to form polymer surfacerelief gratings or EPSs which may be used as deep SRGs. The liquidcrystal may be removed by gently immersing the grating into a solventsuch as IPA. The IPA may be chilled and may be kept at a temperaturelower than room temperature while the grating is immersed in the IPA.The periodic structure may be then removed from the solvent and dried.In some embodiments, the periodic structure is dried using a high flowair source such as compressed air. After the LC is removed from theperiodic structure, a polymer-air surface relief grating is formed.

As shown in FIGS. 1A-1D, the formed surface relief grating can furtherbe covered with a protective layer. In some instances, the protectivelayer may be a moisture and oxygen barrier with scratch resistancecapabilities. In some instances, the protective layer may be a coatingthat does not fill in air gap regions where LC that was removed onceexisted. The coating may be deposited using a low temperature process.In some implementations, the protective layer may have anti-reflective(AR) properties. The coating may be a silicate or silicon nitride. Thecoating process may be performed by a plasma assisted chemical vapordeposition (CVD) process such as a nanocoating process. The coating maybe a parylene coating. The protective layer may be a glass layer. Avacuum or inert gas may fill the gaps where LC that was removed onceexisted before the protective layer is applied. In some embodiments, thecoating process may be integrated with the LC removal process (206). Forexample, a coating material may be mixed with the solvent which is usedto wash the LC from the periodic structure.

FIG. 3A illustrates a cross sectional schematic view of an exemplaryembodiment of a polymer-air periodic structure 3000 implemented on awaveguide 3002. The polymer-air surface relief grating 3000 includesperiodic polymer sections 3004 a. Adjacent polymer sections 3004 asandwich air sections 3004 b. The air sections 3004 b are sandwiched bypolymer sections 3004 a. The air sections 3004 b and polymer sections3004 a have different indexes of refraction. Advantageously, thepolymer-air surface relief Bragg grating 3000 may be formed with a highgrating depth 3006 a to Bragg fringe spacing 3006 b ratio which maycreate a deep SRG. As illustrated, the polymer sections 3004 a and theair sections 3004 b extend all the way to the waveguide 3002 to directlycontact the waveguide 3002. As illustrated, there may be no bias layerbetween the polymer sections 3004 a and the air sections 3004 b and thewaveguide 3002. As discussed previously, deep SRGs may exhibit manybeneficial qualities such as high S-diffraction efficiency which may notbe present within the typical SRGs.

In one example, a polymer-air surface relief Bragg grating 3000 may havea Bragg fringe spacing 3006 b of 0.35 μm to 0.8 μm and a grating depthof 1 μm to 3 μm. in some embodiments, a grating depth of 1 μm to 3 μmmay be too thick for most EPS (with ashing and ALD) for fold and outputgratings for waveguide applications, where leaky structures are needed.Values in the ranges of 0.1 μm to 0.5 μm might be more suitable forleaky structures, particularly when modulation is increased with ashingand ALD. For example, Input structures may include a depth in the rangeof 0.4 μm up to 1 μm. Structures with a depth from 1 μm to 3 μm may beadvantageous for display cases, and structures even taller may beadvantageous for non-display applications. Structures with half period(e.g. a critical dimension) to height ratio of 7:1 or even 8:1 have beendemonstrated with advantageous effects.

In some embodiments, the polymer sections 3004 a may include at leastsome residual liquid crystal when the liquid crystal is not completelyremoved during step 206 described in connection with FIG. 2. In someembodiments, the presence of residual LC within the polymer rich regionsmay increase refractive index modulation of the final polymer SRG. Insome embodiments, the air sections 3004 b may include some residualliquid crystal if the liquid crystal is not completely removed duringstep 206 from these air sections 3004 b. In some embodiments, by leavingsome residual liquid crystal within the air sections 3004 b, a hybridgrating as described in connection with FIGS. 4-5 may be created.

In some embodiments, an optical layer 3008 may also exist between thepolymer sections 3004 a and the air sections 3004 b and the waveguide3002. The optical layer 3008 may be a bias layer between the polymersections 3004 a and the air sections 3004 b and the waveguide 3002. FIG.3B illustrates a cross sectional schematic view of a polymer-airperiodic structure 3000 a in accordance with an embodiment of theinvention. The polymer-air periodic structure 3000 a includes manyidentically numbered components with the polymer-air periodic structure3000 of FIG. 3A. The description of these components is applicable withthe polymer-air periodic structure 3000 a described in connection withFIG. 3B and this description will not be repeated in detail. Asillustrated, an optical layer 3008 is positioned between the polymersections 3004 a and the air sections 3004 b and the waveguide 3002. Thewaveguide may include a substrate 3002 and an optical layer 3008 (e.g.the bias layer) sandwiched by the substrate 3002 and the polymerperiodic structure and wherein the polymer periodic structure extendsall the way to the optical layer to directly contact the optical layer.The polymer periodic structure includes the polymer sections 3004 a andthe air sections 3004 b.

In some examples, an optical layer 3008 may be formed when gratings areformed using Nano Imprint Lithography (NIL). The grating pattern may beimprinted in a resin leaving a thin layer underneath the periodstructure which is a few microns thick. This optical layer 3008, whichmay be a few microns in thickness, may reside between the waveguide(e.g. glass) substrate and the period grating layer and may not beremoved without damaging the NIL grating structure. When the biasrefractive index is lower than that of the waveguide substrate the biaslayer may confine light for some field angles (furthest from TIR in thewaveguide) to the high index substrate which may be analogous tocladding on an optical fiber core. This may cause the field supported inthe waveguide to be clipped and hence not supported by the waveguide.Elimination of the bias layer can offer grating coupling from a highindex substrate with a grating structure of lower index than thesubstrate which may not be possible with the bias layer present.

In formation of EPSs, since the phase separation process leading tograting formation may take place through the entire holographicrecording material layer, gratings may be formed throughout the volumeof the cell gap resulting in no optical layer 3008. The elimination ofthe optical layer 3008 can allow wider fields of view to be realizedwhen using high index waveguide substrates. Wide field of view angularcontent may be propagated with lower refractive index gratingstructures. EPSs may deliver similar optical performance characteristicsto nanoimprinted SRGs by offering taller structures albeit at lower peakrefractive index. This may open up the possibility of low-costfabrication of diffractive structures for high efficiency waveguides.

Although the elimination of the optical layer 3008 from a waveguidegrating device can offer the field of view benefits as discussed above,in some embodiments, an optical layer 3008 may be present in EPSs. Thepresent disclosure allows for waveguide grating devices with or withoutthe optical layer 3008.

In some embodiments, having the optical layer 3008 can be an advantageas the evanescent coupling between the waveguide and the grating is afunction of the indices of the gratings structure (e.g. the gratingdepth the angles of the faces making up the structure and the gratingdepth), the waveguide core, and the optical layer 3008 (if present). Insome embodiments, the optical layer 3008 may be used as a tuningparameter for optimizing the overall waveguide design for betterefficiency and bandwidth. Unlike nanograting SRGs, a bias layer usedwith an EPS may not be of the same index as the grating structure.

FIG. 3C is a graph illustrating the effect of optical layer 3008thickness on the diffraction efficiency versus incident angle. Thedotted line 3052 represents an incident angle of +6 degrees. Evanescentcoupling may begin (towards negative angles) at an angle ofapproximately +6 degrees. The various plots represent differentthicknesses of optical layer 3008. The plots show that the optical layer3008 thickness can be used to increase the diffractive coupling (e.g.for an optical layer thickness of 300 nm) over the approximate angularrange from +6 degrees to +16 degrees. There may be lower coupling overthe approximate angular range from 0 degrees to +6 degrees. The S-shapedcharacteristic can be altered by replacing the 300 nm optical layer witha thicker or thinner bias layer as shown in FIG. 3C. In someembodiments, the thickness of the optical layer may be 2 μm to 3 μm, 1μm to 2 μm, or 0.5 μm to 1 μm.

In some embodiments, the EPS may be fabricated as part of a stackedgrating structure. Examples of stacked grating structures are discussedin International Pub. No. WO 2022015878, entitled “Nanoparticle-basedholographic photopolymer materials and related applications” and filedJul. 14, 2021, which is hereby incorporated by reference in its entiretyfor all purposes. In some embodiments, the EPS may include a multilayerstructure including a release layer. Release layers may be used in agrating stacking process that may reduce the number of glass layers. Therelease layer may be applied at each exposure step to allow thedeposition of a new layer of recording material. Similar processes mayalso allow angular bandwidth to be increased by stacking multiplegratings with different slant angles.

As discussed above, in many the embodiments, the invention also providesa method for fabricating a hybrid surface relief/periodic structure.FIG. 4A conceptually illustrates an apparatus 210A that can be used in astep of a method for fabricating hybrid surface relief gratings (hybridSRGs) in which a mixture 211 of monomer and liquid crystal deposited ona transparent substrate 212 is exposed to holographic exposure beams213,214, in accordance with an embodiment of the invention. FIG. 4Bconceptually illustrates an apparatus 210B that can be used in a step ofa method for fabricating hybrid SRGs from an HPDLC periodic structure215 formed on the transparent substrate using the holographic exposurebeams in accordance with an embodiment of the invention. FIG. 4Cconceptually illustrates an apparatus 210C that can be used in a step ofa method for fabricating a surface relief grating in which liquidcrystal is removed from an HPDLC periodic structure 215 to formpolymer-air SRGs 216 in accordance with an embodiment of the invention.These polymer-air SRGs 216 or EPSs may be deep SRGs. It is appreciatedthat the steps illustrated in and described in connection with FIGS.4A-4C roughly correspond to the steps illustrated in and described inconnection with FIGS. 2A-2C in the process to create a polymer-air SRGand thus the previous description will be applicable to FIGS. 4A-4C.

In addition, FIG. 4D conceptually illustrates an additional step whichmay be performed to create a hybrid grating. The apparatus 210D can beused in a step of a method for fabricating a surface relief grating inwhich a surface relief grating is at least partially refilled withliquid crystal to form a hybrid SRGs 217, in accordance with anembodiment of the invention. The refilled liquid crystal may be ofdifferent consistency to the previously removed liquid crystal that waspreviously removed in FIG. 4C. Further, it is appreciated that theliquid crystal removed in FIG. 3C may only be partially removed in analternative method to forming hybrid SRGs 217. In addition, FIG. 4Econceptually illustrates an apparatus 210E can be used in a step of amethod for fabricating a surface relief grating in which hybrid SRGs 217formed in the step illustrated in FIG. 4D is covered with a protectivelayer 218, in accordance with an embodiment of the invention. In thehybrid EPSs, the air sections 3004 b of FIGS. 3A and 3B may be replacedwith a backfill material as discussed above.

FIG. 5 is a flowchart showing an exemplary method for forming a hybridsurface relief-periodic structure from a HPDLC periodic structure formedon a transparent substrate in accordance with an embodiment of theinvention. As shown, the method 220 of forming hybrid surfacerelief-periodic structure is provided. Referring to the flow diagram,method 220 includes providing (221) a mixture of at least one monomerand at least one liquid crystal. The at least one monomer may include anisocyanate-acrylate monomer. Providing the mixture of the monomer andthe liquid crystal may also include mixing one or more of the followingwith the at least one monomer and the liquid crystal: photoinitiator,coinitiator, multifunctional thiol, and/or additional additives. Thismixture may be allowed to rest in order to allow the coinitiator tocatalyze a reaction between the monomer and the thiol. The rest periodmay occur in a dark space or a space with red light (e.g. infraredlight) at a cold temperature (e.g. 20° C.) for a period of approximately8 hours. After resting, additional monomers may be mixed into themonomer. This mixture may be then strained or filtered through a filterwith a small pore size (e.g. 0.45 μm pore size). After straining thismixture may be stored at room temperature in a dark space or a spacewith red light before coating.

Next, a transparent substrate can be provided (222). In certainembodiments, the transparent substrate may be a glass substrate or aplastic substrate. A non-stick coating may be applied to the transparentsubstrate before the mixture is coated on the substrate. The non-stickcoating may be a release layer which allows the transparent substrate toeasily release from the exposed periodic structure. Various examples ofrelease layers are discussed below. A layer of the mixture can bedeposited (223) onto a surface of the substrate. In some embodiments,the mixture is sandwiched between the transparent substrate and anothersubstrate using glass spacers to maintain internal dimensions.Holographic recording beams can be applied (224) to the mixture layer.The holographic recording beams may be a two-beam interference patternwhich may cause phase separation of the LC and the polymer. Afterapplying the holographic recording beams, the mixture may be cured. Thecuring process may include leaving the mixture under low-intensity whitelight for a period of time under the mixture fully cures. The lowintensity white light may also cause a photo-bleach dye process tooccur. Thus, an HPDLC periodic structure having alternating polymer richand liquid crystal rich regions can be formed (225). In someembodiments, the curing process may occur in 2 hours or less. Aftercuring, one of the substrates may be removed exposing the HPDLC periodicstructure. The release layer may aid in allowing the one of thesubstrates to not stick to the exposed periodic structure.

HPDLC grating may include alternating sections of liquid crystal richregions and polymer regions. The liquid crystal in the liquid crystalrich regions can be removed (226) to form polymer surface reliefgratings or EPSs which is a form of deep SRGs. The liquid crystal may beremoved by gently immersing the exposed periodic structure into asolvent such as isopropyl alcohol (IPA). The IPA may be kept at a lowertemperature while the periodic structure is immersed in the IPA. Theperiodic structure is them removed from the solvent and dried. In someembodiments, the periodic structure is dried using a high flow airsource such as compressed air. After the LC is removed from the grating,a polymer-air surface relief periodic structure is formed. The resultingperiodic structure may be the periodic structure described in connectionwith FIGS. 3A and 3B. There may or may not be a bias layer present asillustrated in FIG. 3A or 3B. The steps 221-226 of FIG. 5 roughlycorrespond to the steps described in connection with FIG. 2 in creatinga polymer-air SRG and thus these descriptions are applicable to FIG. 5.

Further, method 220 includes at least partially refilling (227) clearedliquid crystal rich regions with liquid crystal to form hybrid SRGs. Therefilled liquid crystal may be of different consistency to thepreviously removed liquid crystal that was previously removed in step226. Further, it is appreciated that the liquid crystal removed in step226 may only be partially removed in an alternative method to forminghybrid SRGs. Advantageously, hybrid SRGs may provide the ability totailor specific beneficial characteristics of the SRGs. One particularcharacteristic that may be improved by the inclusion of at least someliquid crystal within the SRGs is a decrease in haze properties. In someembodiments, the cleared liquid crystal rich regions may be backfilledwith a different refractive material than liquid crystal. The backfillmaterial may have a different refractive index than the remainingpolymer rich regions.

As shown in FIG. 4E, the formed surface relief grating can further becovered with a protective layer. In some instances, the protective layermay be a moisture and oxygen barrier with scratch resistancecapabilities. In some instances, the protective layer may be a coatingthat does not fill in air gap regions where LC that was removed onceexisted. The coating may be deposited using a low temperature process.In some implementations, the protective layer may have anti-reflective(AR) properties. The coating may be a silicate or silicon nitride. Thecoating process may be performed by a plasma assisted chemical vapordeposition (CVD) process such as a plasma-treat nanocoating process. Thecoating may be a parylene coating. The protective layer may be a glasslayer. A vacuum or inert gas may fill the gaps where LC that was removedonce existed before the protective layer is implemented. In someembodiments, the coating process may be integrated with the LC removalprocess (226). For example, a coating material may be mixed with thesolvent which is used to wash the LC from the grating. In someimplementations, the coating material may be a material with a lower orhigher refractive index than the polymer and fill the spaces betweenadjacent polymer portions. The refractive index difference between thepolymer and the coating material may allow the polymer SRGs to continueto diffract.

Although FIGS. 1-5 illustrate specific methods and apparatus for formingdeep SRGs and hybrid surface relief/Bragg gratings, variousmanufacturing methods implementing different steps or modifications ofsuch steps can be utilized. As can readily be appreciated, the specificprocess utilized can depend on the specific requirements of the givenapplication. For example, many embodiments utilize another periodicstructure as a protective layer.

Hybrid SRG/periodic structure with shallow SRG structures may lead tolow SRG diffraction efficiencies. The methods disclosed in the presentdisclosure allows for more effective SRG structures to be formed byoptimizing the depth of the liquid crystal in the liquid crystal richregions such that the SRGs has a high depth to grating pitch ratio whileallowing the periodic structure to be sufficiently thick for efficientdiffraction. In many embodiments, the periodic structure component ofthe hybrid grating can have a thickness in the range 1-3 micrometer. Insome embodiments, the SRG component of the hybrid grating can have athickness in the range 0.25-3 micrometer. The initial HPDLC periodicstructure would have a thickness equal to the sum of the final SRG andperiodic structure components. As can readily be appreciated, thethickness ratio of the two periodic structure components can depend onthe waveguide application. In some embodiments, the combination of anSRG with a periodic structure may be used to fine-tune angular bandwidthof the periodic structure. In some cases, the SRG can increase theangular bandwidth of the periodic structure.

In many embodiments, in the hybrid SRGs illustrated in FIGS. 4A-4E, therefill depth of the liquid crystal regions of the periodic structure canbe varied across the periodic structure to provide spatially varyingrelative SRG/periodic structure strengths. In some embodiments, duringthe liquid crystal removal and refill as defined in steps 206, 226, and227, the liquid crystal in the liquid crystal rich grating regions canbe totally or partially removed. In several embodiments, the liquidcrystal used to refill or partially refill the liquid crystal-clearedregions can have a different chemical composition to the liquid crystalused to form the initial HPDLC periodic structure. In variousembodiments, a first liquid crystal with phase separation propertiescompatible with the monomer can be specified to provide a HPDLC gratingwith optimal modulation and grating definitions while a second refillliquid crystal can be specified to provide desired index modulationproperties in the final hybrid grating. In a number of embodiments, thepolymer portion of the hybrid grating can be switchable with electrodesapplied to surfaces of the substrate and the cover layer. In manyembodiments, the refill liquid crystals can contain additives which mayinclude but are not limited to the features of improving switchingvoltage, switching time, polarization, transparency, and otherparameters. A hybrid grating formed using a refill process would havethe further advantages that the LC would form a continuum (rather thanan assembly of LC droplets), thereby reducing haze. In some embodimentsthe backfill material may be a material with a different refractiveindex than the polymer regions. The backfill material may not be aliquid crystal material.

While deep SRGs, EPSs, and/or hybrid SRGs may be described in thecontext of S-diffracting gratings and P-diffracting gratings, theseperiodic structures have applicability in many other periodic structuretypes. These include but are not limited to angle multiplexed gratings,color multiplexed gratings, fold gratings, dual interaction gratings,rolled K-vector gratings, crossed fold gratings, tessellated gratings,chirped gratings, gratings with spatially varying refractive indexmodulation, gratings having spatially varying grating thickness,gratings having spatially varying average refractive index, gratingswith spatially varying refractive index modulation tensors, and gratingshaving spatially varying average refractive index tensors. Further, deepSRGs, EPSs, and/or hybrid SRGs may be switchable or non-switchableperiodic structures depending on their specific implementation. DeepSRGs, EPSs, and/or hybrid SRGs may be fabricated on a plastic substrateor a glass substrate. These periodic structures may also be fabricatedon one substrate and transferred to another substrate.

In some embodiments, EPSs may be either unslanted or slanted, orspatially varying slanted structures (e.g., rolled K-vector type withvery large height to period aspect ratio, typically in the range of 2 to12). Slanted EPSs will be illustrated in various examples below. An EPSmay include a height of 2.0 μm with a 0.400 μm period (e.g. aspectratio=5). The combination of controlled, repeatable, slant angles andtall aspect ratios may provide EPS structures Bragg properties whichenable high efficiency waveguide designs. Moreover, EPSs can befabricated with or without bias layers. EPSs may be made using a phaseseparation process that can be implemented using ink jet printingprocesses and offers significant economic advantages in mass productionover the complex wafer etching and nano imprint lithographic processused to produce some SRG display waveguides.

In some embodiments, EPSs may be configured as at least one ofmultiplexed grating, a slanted grating, a photonic crystal, mixedmodulation grating, a hybrid polymer grating structure, a sinusoidalgrating (e.g. formed by plasma ashing of isotropic photopolymergratings), a metasurface, or a grating structure combining a slantedvolume grating overlaid by a surface relief grating. Slanted volumegrating overlaid by a surface relief grating may include a gratingstructure which is substantially a volume grating with the gratingthickness of the low index regions having a slight smaller gratingthickness than the high index regions. The variation of the gratingthickness may be tens of nanometers while the average volume gratingthickness may be from 1-10 micron depending on the application. Theconfiguration is equivalent to an SRG layer sitting on top of a volumegrating layer. In some embodiments, the SRG and volume grating maycombine the benefit of the wider angular bandwidth of the SRG and thehigher efficiency of the volume grating. This is more likely to be thecase when the volume grating is thinner. The surface relief structurecan arise naturally as a result of non-linearity in the diffusionprocess at the extremities of the grating. The effect may be controlledusing plasma ashing or some other type of etching processed applied tothe grating. A combined SRG and volume grating can also be formed byfabricating an EPS and then partially backfilling it with anothermaterial. Such a configuration is discussed as a hybrid gratingthroughout the current disclosure.

In some embodiments, the EPS is formed using different diffusion regimeshaving different diffusion constants in at least two differentdirections. In complex grating structures such as photonic crystals thespacing of the diffracting nodes may lead to nonuniformities in themodulation of the finished grating. Material components with differentdiffusion time constants may allow more efficient grating formationalong different directions. In some embodiments, the EPS is formed toprovide a photonic structure incorporating a slanted grating structureand a photonic crystal structure including diffracting nodes. Gratingconfigurations including regions in which the grating includes slanted(or unslanted) planar fringes and photonic crystal regions where thediffracting structures comprising diffracting nodes may include elongateelements such as cylinders which many may be tilted. The photoniccrystal regions may include a 3D diffracting node structure. In someembodiments, the EPS is formed to provide a photonic crystal includingslanted diffracting features wherein the principle nodes of the photoniccrystal are formed by multiplexed gratings wherein plasma ashing isapplied along tracks parallel to principal crystal directions. Thephotonic crystal may be formed by multiplexing two or more gratings suchthat the intersection regions of the bright fringes form modulationpeaks. The regions around these peaks may be eroded using plasma ashingapplied along the low modulation tracks which are parallel to theprinciple crystal directions. The cross-section geometry of the nodesmay depend on the number of gratings and their relative orientations.For example, crossing two gratings at ninety degrees may result insquare cross section nodes. Tilted photonic crystal nodes may be formedusing slanted gratings. This principle can be extended to threedimensional photonic crystals.

In some embodiments, the polymer grating structure may be formed toprovide photonic crystal formed by three-beam-recorded Bravais latticesand other structures, the process including plasma ashing. All five twodimensional Bravais lattices (e.g. square, triangular, rhombic) may berecoded using a three-beam exposure system. The techniques forfabricating two dimensional photonic crystals may also be applied tomore complex three-dimensional structures, including 3D Bravais latticesand other structures. All fourteen of the Bravais lattice can berecorded using three beams or even two beams using more multipleexposure techniques. Dual-beam multiple exposure schemes may be usedwith the recording medium undergoing a single axis rotation between eachexposure.

Discussion of Various Implementations of Deep SRGs or EPSs

In many embodiments, deep SRGs can provide a means for controllingpolarization in a waveguide. SBGs are normally P-polarization selective,leading to a 50% efficiency loss with unpolarized light sources such asOLEDs and LEDs. Hence, combining S-polarization diffracting andP-polarization diffracting periodic structures can provide a theoretical2× improvement over waveguides using P-diffracting periodic structuresonly. In some embodiments, an S-polarization diffracting periodicstructures can be provided by a periodic structure formed in aconventional holographic photopolymer. In some embodiments anS-polarization diffracting periodic structures can be provided by aperiodic structure formed in a HPDLC with birefringence altered using analignment layer or other process for realigning the liquid crystaldirectors. In some embodiments, an S-polarization diffracting periodicstructure can be formed using liquid crystals, monomers and otheradditives that naturally organize into S-diffracting periodic structuresunder phase separation. In many embodiments, an S-polarizationdiffracting periodic structures can be provided by SRGs. Using theprocesses described above, a deep SRG exhibiting high S-diffractionefficiency (up to 99%) and low P-diffraction efficiency can be formed byremoving the liquid crystal from SBGs formed from holographic phaseseparation of a liquid crystal and monomer mixture.

Deep SRGs can also provide other polarization response characteristics.Several prior art theoretical studies such as an article by Moharam(Moharam M. G. et al. “Diffraction characteristics of photoresistsurface-relief gratings”, Applied Optics, Vol. 23, page 3214, Sep. 15,1984) point to deep surface relief gratings having both S and Psensitivity with S being dominant. In some embodiments, deep SRGsdemonstrate the capability of providing an S-polarization response.However, deep SRGs may also provide other polarization responsecharacteristics. In many embodiments, deep surface relief gratingshaving both S and P sensitivity with S being dominant are implemented.In some embodiments, the thickness of the SRG can be adjusted to providea variety of S and P diffraction characteristics. In severalembodiments, diffraction efficiency can be high for P across a spectralbandwidth and angular bandwidth and low for S across the same spectralbandwidth and angular bandwidth. In number of embodiments, diffractionefficiency can be high for S across the spectral bandwidth and angularbandwidth and low for P across the same spectral bandwidth and angularbandwidth. In some embodiments, high efficiency for both S and Ppolarized light can be provided. A theoretical analysis of an SRG ofrefractive index 1.6 immersed in air (hence providing an average gratingindex of 1.3) of period 0.48 micron, with a 0 degrees incidence angleand 45 degree diffracted angle for a wavelength of 0.532 micron is shownin FIGS. 5-7. FIG. 5 is a graph showing calculated P-polarized andS-polarized diffraction efficiency versus incidence angle for a1-micrometer thickness deep surface relief grating, demonstrating thatin this case high S and P response can be achieved. FIG. 6 is a graphshowing calculated P-polarized and S-polarized diffraction efficiencyversus incidence angle for a 2-micrometer thickness deep surface reliefgrating, demonstrating that in this case the S-polarization response isdominant over most of the angular range of the grating. FIG. 7 is agraph showing calculated P-polarized and S-polarized diffractionefficiency versus incidence angle for a 3-micrometer thickness,demonstrating that in this case the P-polarization response is dominantover a substantial portion of the angular range of the grating.

In many embodiments, a photonic crystal can be a reflection periodicstructure or deep SRG formed by a LC extraction process. A reflectiondeep SRG made using phase separation followed by LC subtraction canenable wide angular and spectral bandwidth. In many embodimentsreplacing the current input SBG with a reflection photonic crystal canbe used to reduce the optical path from a picture generation unit (PGU)to a waveguide. In some embodiments, a PGU pupil and the waveguide canbe in contact. In many embodiments, the reflection deep SRG can beapproximately 3 microns in thickness. The diffracting properties of anLC extracted periodic structure mainly result from the index gap betweenthe polymer and air (not from the depth of the periodic structure as inthe case of a typical SRG).

Discussion of Thiol Additives within Initial Mixture

FIGS. 9A and 9B illustrate comparative scattering electron microscopy(SEM) images of example mixtures used to fabricate polymer-air SRGs. Asdiscussed previously, the monomer within the initial mixture may beacrylate or thiolene based. It has been discovered that with somemonomers such as acrylate-based monomers, after holographic exposure,during washing, the solvent not only removes liquid crystal material butalso polymer which is unideal. It has been discovered that amultifunctional thiol additive may solve this issue by strengthening thepolymer and thus allowing it to be strong enough to withstand thesolvent wash. Without limiting to any particular theory, thiol additivemay improve the mechanical strength of formulations consisting of lowfunctionality acrylate monomers which tend to form mechanically weakpolymers due to reduced cross-linking. Acrylate monomer formulations maybe advantageous because they may exhibit high diffraction efficiencywith lower haze. Thus, adding thiol could allow Acrylate monomerformations to be a viable option in fabrication of polymer SRGs.

There may be a trade-off between phase separation, periodic structureformation, and mechanical strength between different formulations.Periodic structure formation may benefit from mixtures that contain lowfunctionality monomers that react slower, form fewer cross-linkages, andallow greater diffusion of non-reactive components (e.g. LC) duringholographic exposure. Conversely, mixtures consisting of highfunctionality monomers may exhibit better phase separation and polymermechanical strength due to greater cross-linking, but may react sorapidly that the non-reactive components do not have sufficient time todiffuse and thus may exhibit lower diffraction efficiency as a result.

Without limitation to any particular theory, the thiol additives may getaround these limitations by reacting with acrylates orisocyanate-acrylates to form a loose scaffolding prior to holographicexposure. This scaffolding may improve the mechanical strength anduniformity of the cured polymer. Thus, the mechanical strength may betuned through slight adjustments of the thiol functionality andconcentration without significantly raising the average functionality ofthe monomer mixture and disrupting grating formation.

FIG. 9A illustrates an initial mixture whereas FIG. 9B illustrate acomparative mixture which includes 1.5 wt % thiol. However, other weightpercentages of thiol additive have been contemplated. For example, aweight percentage of thiol additive may be 1% to 4% or 1.5% to 3%. Insome embodiments, the multifunctional thiol may be trimethylolpropanetris(3-mercaptopropionate). Both FIGS. 9A and 9B include polymer denseregions 902 a/902 b and air regions 904 a/904 b. As illustrated, theadded thiol may produce a denser polymer structure within the polymerdense regions 902 a of FIG. 9B than the polymer dense regions 902 b ofFIG. 9A which may increase grating performance. It has been discoveredthat the weight percentage of thiol additive should be balanced in orderto provide stability within the polymer structure to withstand thesolvent wash however not to be rigid as to not allow the liquid crystalto be released during the solvent wash.

Comparison Between HPDLC Periodic Structure Performance with Polymer-AirSRG Performance

FIGS. 10A and 10B illustrates images of comparative examples of an HPDLCgrating and a polymer SRG or EPS. FIG. 10A illustrates performance foran example HPDLC periodic structure where liquid crystal has not beenremoved. The periodic structure of FIG. 10A includes a 20-30%P-diffraction efficiency while exhibiting a nominal or almost 0%S-diffraction efficiency. FIG. 10B illustrates performance of an examplepolymer-air SRG where the LC has been removed. The periodic structure ofFIG. 10B includes a 18-28% P-diffraction efficiency while exhibiting aS-diffraction efficiency of 51-77%. Thus, polymer-air SRGs where LC hasbeen removed demonstrate a comparatively high S-diffraction efficiencywhile maintaining a comparable P-diffraction efficiency. Further, thegrating of FIG. 10B includes a P-diffraction haze of 0.11-0.15% and aS-diffraction haze of 0.12-0.16%.

FIGS. 11A and 11B illustrates plots of comparative examples of an HPDLCperiodic structure where liquid crystal has not been removed and apolymer SRG or EPS where liquid crystal has been removed. FIG. 11Aillustrates the P-diffraction efficiency and S-diffraction efficiencyfor an HPDLC periodic structure where liquid crystal remains. A firstline 1102 a corresponds to P-diffraction efficiency and a second line1104 a corresponds to S-diffraction efficiency. FIG. 11B illustrates theP-diffraction efficiency and S-diffraction efficiency for a polymer SRGor EPS where liquid crystal has been removed. A first line 1102 bcorresponds to P-diffraction efficiency and a second line 1104 bcorresponds to S diffraction efficiency. As illustrated, S-diffractionefficiency dramatically increases after liquid crystal has been removedwhile P-diffraction efficiency remains relatively similar. In someembodiments, the ratio of S-diffraction efficiency to P-diffractionefficiency may be adjusted by using different grating periods, gratingslant angles, and grating thicknesses.

Various Example Deep SRG Depths

FIGS. 12A and 12B illustrate various comparative examples ofP-diffraction and S-diffraction efficiencies with deep SRGs of variousdepths. Each of these plots show diffraction efficiency vs. angle. InFIG. 12A, the deep SRG has a depth of approximately 1.1 μm. The firstline 1102 a represents S-diffraction efficiency and the second line 1104a represents P-diffraction efficiency. As illustrated the peakS-diffraction efficiency is approximately 58% and the peak P-diffractionefficiency is 23%. It is noted that the haze for S-diffraction is 0.12%and haze for P-diffraction is 0.11% for this example. Such highdiffraction efficiency with low haze may make deep SRGs with a depth ofapproximately 1.1 μm particularly suitable for multiplexed gratings.

In FIG. 12B, the deep SRG has a depth of approximately 1.8 μm. The firstline 1102 b represents S-diffraction efficiency and the second line 1104b represents P-diffraction efficiency. As illustrated the peakS-diffraction efficiency is approximately 92% and the peak P-diffractionefficiency is 63%. It is noted that the haze for S-diffraction is 0.34%and haze for P-diffraction is 0.40% for this example. Thus, bothS-diffraction and P-diffraction efficiency increase dramatically with anincreased grating depth. It is noted that haze appears to increase withthe increased grating depth.

In some embodiments, an EPS may be spatially variable depth for a singleEPS grating. In some embodiments, different EPSs on the same substratemay have different depths from each other not forgoing the modulationvariation mentioned above on one or more of a multiplicity of EPSgratings on a single substrate. In some embodiments, one or more EPSsmay be positioned on each side of a same substrate. In some embodiments,a mixture of planar and multiplexed EPSs may be positioned on a samewaveguide.

In some embodiments, multiple EPSs may be positioned on a substrateincluding spacially varied duty cycle, grating shape, slant, and/or ALDcoating properties. The different ALD coating properties may spatiallyaffect modulation.

Various Example Initial LC Concentrations in Mixture

FIGS. 13A and 13B illustrate the results of a comparative study ofvarious EPSs with various initial LC concentrations in the initialmixture. FIG. 13A illustrates S-diffraction efficiency vs. angle. FIG.13B illustrates P-diffraction efficiency vs. angle. In FIG. 13A, a firstline 1202 a corresponds to 20% initial LC content, a second line 1204 acorresponds to 30% initial LC content, and a third line 1206 acorresponds to 40% initial LC content. In FIG. 13B, a first line 1202 bcorresponds to 20% initial LC content, a second line 1204 b correspondsto 30% initial LC content, and a third line 1206 b corresponds to 40%initial LC content. Table 1 illustrates a summary of various results ofthe comparative study.

TABLE 1 Initial LC Maximum Maximum Content S-Diffraction P-DiffractionS-Diffraction P-Diffraction in Mixture Efficiency Efficiency Haze Haze20%  10%  5% 0.10% 0.12% 30% ≥40% 18% 0.14% 0.13% 40% ≥55% 23% 0.12%0.11%

As is illustrated in FIGS. 13A and 13B and noted in Table 1, the maximumS-diffraction and maximum P-diffraction appear to both increase withhigher initial LC content while the S-diffraction haze and P-diffractionhaze stay approximately constant.

FIGS. 14A and 14B illustrate additional example S-diffraction andP-diffraction efficiencies for various initial LC concentrations. FIG.14A illustrates S-diffraction efficiency for various example EPSsincluding various initial LC contents. FIG. 14B illustrate P-diffractionefficiency for various example EPSs including various LC contents. Forboth FIGS. 14A and 14B, sequentially from top to bottom the linesrepresent: 32% LC content, 30% LC content, 28% LC content, 26% LCcontent, 24% LC content, 22% LC content, and 20% LC content. Asillustrated, the S-diffraction and P-diffraction efficiencies aredirectly related to the amount of LC content (e.g. higher LC contentyields higher S-diffraction and P-diffraction efficiencies).

Without being limited to any particular theory, the initial LC contentrelates to the amount of phase separation between the LC and the monomerthat occurs during the holographic exposure process and polymerizationprocess. Thus, a higher LC content will increase the amount of LC richregions which are removed to make more air regions after washing. Theincreased air regions make greater refractive index differences (An)between the air regions (formerly liquid crystal rich regions) and thepolymer rich regions which increases both S-diffraction andP-diffraction efficiencies. In some embodiments, the average refractiveindex of the polymer SRGs may be adjusted by adjusting the initialneutral substance (e.g. LC) content, thereby either increasing ordecreasing the volume of polymer after removal of the neutral substance.Further, increasing the initial neutral substance content may impact themechanical strength. Thus, an increase or decrease in mechanicalstrengthener such as thiol additive may be used to balance out theincrease or decrease in mechanical strength.

Various Example Grating Thicknesses

FIG. 15 is a graph of diffraction efficiency versus grating layerthickness showing the dependence of evanescent coupling on the gratinglayer thickness. The duty cycle refers to the ratio of the width of apolymer fringe to the width of the air gap between neighboring polymerfringes. In other words, a 90% duty cycle means 90% of the grating ispolymer and 10% is air.

Note that increased grating thickness may lead to increased couplingwhen fringe and substrate refractive indices are matched. For poorrefractive index match to substrate (e.g. 1.6 refractive index fringeson 1.8 refractive index substrate) there may be only evanescentcoupling, so increasing fringe depth may not affect couplingsignificantly. The plots in FIG. 15 show that a grating structure ofrefractive index 1.6 with a 90% duty cycle gives an average refractiveindex of 1.54. Increasing the grating index to 1.65 at the same dutycycle results in an average refractive index of 1.59. No diffractionefficiency exists in either case. Increase the grating refractive indexmay result in a diffraction efficiency. For example, for a gratingstructure of index 1.7 and 1.8 with a 90% duty cycle with resultingaverage refractive indices of 1.63 and 1.72 respectively both providediffractive efficiency. In some embodiments, there may be gratingstructures on a 1.8 index substrate with input light incident at 0degrees to the grating normal.

Embodiments Manufactured Using Various Substrate Configurations

In various embodiments, a pair of substrates may sandwich an unexposedholographic mixture. The pair of substrates may include a base substrateand a cover substrate. Advantageously, the cover substrate may havedifferent properties than the base substrate to allow for the coversubstrate to adhere to the unexposed holographic mixture layer whilecapable of being removed from the formed holographic polymer dispersedliquid crystal periodic structure after exposure. The formed holographicpolymer dispersed liquid crystal grating may remain on the basesubstrate after the cover substrate is removed.

FIGS. 16A-16G illustrate an example process flow for fabricating deepSRGs in accordance with an embodiment of the invention. This processflow is similar to the process flows described in connection with FIGS.1A-1D and FIGS. 4A-4E and includes many of the same references numbersthe description of which is applicable to the description of FIGS.15A-15G. Further, FIGS. 15A-15G also includes a cover substrate 1502,the function of which will be described in detail below.

In FIG. 16A, a pair of substrate 212,1502 sandwiches an unexposedholographic mixture layer 211. The pair of substrate 212,1502 mayinclude a base substrate 212 and a cover substrate 1502. The coversubstrate 1502 may have different properties than the base substrate 212to allow for the cover substrate to adhere to the unexposed holographicmixture layer 211 while capable of being removed from the formedholographic polymer dispersed liquid crystal grating after exposure.

In FIG. 16B, the holographic mixture layer 211 is exposed by a pair ofholographic recording beams 213,214. As illustrated in FIG. 16C, theholographic recording beams 213,214 expose the holographic mixture layer211 to form a holographic polymer dispersed liquid crystal grating 215.The holographic polymer dispersed liquid crystal grating 215 may includealternating polymer rich regions and liquid crystal rich regions. InFIG. 16D, the cover substrate 1502 may be removed exposing theholographic polymer dispersed liquid crystal grating 215.

Advantageously, the cover substrate 1502 may have different propertiesthan the base substrate 212 such as different materials or differentsurface properties. For example, the base substrate 212 may be made outof plastic whereas the cover substrate 1502 may be made out of glass.The cover substrate 1502 may be removed allowing the holographic polymerdispersed liquid crystal grating 215 to remain on the base substratewithout damaging the holographic polymer dispersed liquid crystalgrating 215 during removal.

In some embodiments, the base substrate 212 may be treated on thesurface contacting the holographic mixture layer 211 with an adhesionpromotion layer such as reagents.

As illustrated in FIG. 16E, the liquid crystal may be removed orevacuated from the liquid crystal rich regions between the polymer richregions leaving air regions. The polymer rich regions and the airregions form polymer-air SRGs 216. In FIG. 16F, a material of differentrefractive index from the polymer rich regions may be refilled into theair regions to form hybrid SRGs 217. In some embodiments, the materialmay be a liquid crystal material. The liquid crystal material may bedifferent from the liquid crystal material removed or evacuated from theliquid crystal rich regions. In some embodiments, a portions of theliquid crystal in the liquid crystal rich regions may be left betweenthe polymer rich regions to form the hybrid SRGs 217.

In FIG. 16G, a protective substrate 218 may be positioned such that thehybrid SRGs 217 are between the protective substrate 218 and the basesubstrate 212. The protective substrate 218 may be used to protect thehybrid SRGs 217. The protective substrate 218 may be omitted in someinstances. The protective substrate 218 and the cover substrate 1502 mayhave different properties where the protective substrate 218 may addmore protection when the grating is implemented into a usable devicethan the cover substrate 1502.

In some embodiments, the polymer-air SRGs 216 may be manufactured asdescribed in connection with FIGS. 1A-1D. In these embodiments, theprotective substrate 218 may be used to protect the polymer-air SRGs216.

In some embodiments the base substrate 212 may be a glass, quartz, orsilica substrate including a glass surface. In some embodiments, thebase substrate 212 may be a plastic substrate and may be coated with asilicon oxide coating (e.g. SiO₂) which may act similar to a glasssurface. The silicon oxide coating or the glass surface may includehydroxyl groups on the top surface. The adhesion promotion material maybe coated on top of the silicon oxide coating. The hydroxyl groups maybe beneficial in allowing the adhesion promotion material to adhere tothe base substrate 212.

In some embodiments, the base substrate 212 may include a glass surfaceincluding hydroxyl groups and may be reacted with reagents such that thereagents react with the hydroxyl groups. FIG. 17 illustrates an examplereaction where the base substrate 212 is exposed to reagents 1604 inaccordance with an embodiment of the invention. The base substrate 212may include hydroxyl groups 1608 on the surface. The base substrate 212is exposed to reagents 1604 and a holographic mixture material 1602including polymer. The reagents 1604 may be a silane coupling agent. Insome embodiments, the reagents 1604 include (R′O)₃—Si—R where R′O— is analkoxy group and —R is an organofunctional group. The alkoxy groups maycondense with the hydroxyl groups 1608 available on the surfaceresulting in surfaces decorated with organofunctional —R groups, whichmay promote formation of covalent bonding of the coupling agent withpolymeric networks within the holographic polymer dispersed liquidcrystal grating 215. The reagents 1604 may adhere to the hydroxyl groups1608 and to the holographic mixture material 1602 creating improvedadhesion when compared to the adhesion of the holographic mixturematerial 1602 without the reagents 1604. The holographic mixturematerial 1602 may form a holographic mixture layer 1610 on the surfaceof the base substrate 212.

FIG. 18 illustrates an example reaction where reagents 1704 are exposedto the base substrate 212. The reagents 1704 may include a silanecoupling agent as illustrated and may couple to hydroxyl groups on thesurface of a glass surface of the base substrate 212.

In some embodiments the cover substrate 1502 may be a glass, quartz, orsilica substrate including a glass surface. In some embodiments, thecover substrate 1502 may be a plastic substrate and may be coated with asilicon oxide coating (e.g. SiO₂) which may act similar to a glasssurface. A release layer may be coated on top of the glass surface. Insome embodiments, similar to the base substrate 212 discussed above, thecover substrate 1502 may include a glass surface including hydroxylgroups and may be reacted with reactants such that the reactants bondwith the hydroxyl groups to form the release layer.

FIG. 19 illustrates an example process for forming the release layer.The cover substrate 1502 may be exposed to a release material 1804. Therelease material 1804 may include a silane based fluoropolymer or fluoromonomer reactant as illustrated. The release material 1804 may include afluoropolymer such as OPTOOL UD509 (produced by Daikin Chemicals), DowCorning 2634, Fluoropel (produced by Cytonix), and EC200 (produced byPPG Industries, Inc) or a fluoro monomer. In some embodiments, therelease material 1804 may include a polysiloxane coating. A polysiloxanecoating may adhere better to materials such as plastic that do not havehydroxyl groups on the surface. A polysiloxane coating may be morerobust and processable, and may be more environmentally-friendly toproduce than a fluoropolymer. The release material 1804 may be appliedthrough vapor deposition, spin coating, or spraying. In someembodiments, the cover substrate 1502 may be reusable and thus afterremoval after holographic exposure, the cover substrate 1502 may beplaced on another holographic mixture layer which may be exposed withholographic beams.

In some embodiments, the cover substrate 1502 and/or the base substrate212 may be a substrate that does not include SiO₂ as discussed above. Inthese instances, a very thin layer of SiO₂ may be applied to the surfaceto facilitate bonding/adhesion of the applied reagent hence enablingsilane chemistry. When the cover substrate 1502 and/or the basesubstrate 212 is a substrate that does not include SiO₂ any surfacemodification followed by bonding can provide adhesion. Surfacemodification may include treating with reagents to introduce reactivefunctional groups including but not limited to hydroxyl groups. In someembodiments, the cover substrate 1502 and/or the base substrate 212 maynot be a glass substrate but may still include hydroxyl groups on thesurface. For example, the cover substrate 1502 and/or the base substrate212 may be sapphire or silicate which may include hydroxyl groups on thesurface. In this case, the hydroxyl groups may help facilitate adhesionof the reagent and thus the thin layer of SiO₂ would not be present.Examples of silicate substrates are manufactured by: Corning Inc. ofCorning, N.Y., Schott A G of Mainz, Germany, Ohara Inc. of Chuo-ku,Sagamihara, Kanagawa, Japan, Hoya Inc. of Japan, AGC Inc. of Marunouchi,Chiyoda-ku, Tokyo, Japan, and CDGM Glass of Central Islip, N.Y.

In some embodiments, the cover substrate 1502 and/or the base substrate212 may include Cleartran which is a form of chemical vapor deposited(CVD) zinc sulfide. A thin layer of SiO₂ may be applied to the Cleartransubstrate to facilitate bonding/adhesion of the applied reagent. In someembodiments, the cover substrate 1502 and/or the base substrate 212 maybe a transparent ceramic such as aluminum oxynitride or magnesiumaluminate. A thin layer of SiO₂ may be applied to the transparentceramic substrate to facilitate bonding/adhesion of the applied reagent.In some embodiments, the cover substrate 1502 and/or the base substrate212 may include plastic such as PMMA, acrylic, polystyrene,polycarbonate, cyclic olefin copolymer, cyclo olefin polymer, polyester.A thin layer of SiO₂ may be applied to the plastic substrate tofacilitate bonding/adhesion of the applied reagent.

Application of Ashing and/or Atomic Layer Deposition Processes in EPSFabrication

In some embodiments, a further post treatment of the EPSs might be usedto remove more of the weak polymer network regions. The post treatmentmay include using a plasma ashing, to reduce or eliminate this vestigialpolymer network. The plasma ashing may be similar to the plasma ashingin semiconductor manufacturing for removing the photoresist from anetched wafer. Exemplary equipment and processes are supplied by PlasmaEtch, Inc. incorporated in CA, USA. In plasma ashing, a monatomic(single atom) substance known as a reactive species may be generatedfrom a plasma source and may be introduced into a vacuum chamber whereit is used to oxidize or plasma ash the material to be removed. Thereactive species may include oxygen or fluorine during the plasmaashing. Advantageously, for processing slanted gratings, the plasma beamcan be directional. In some embodiments, the plasma ashing may beinductively coupled plasma ashing which is a process that allowsindependent control of chemical and physical contributions to the ashingprocess by forming reactive species and ions. A RF bias on a substrateelectrode may be used to control the acceleration of the ions to matchthe requirements of different surface structures. Electrons and ions ina plasma have different mobilities resulting in a direct current (DC)bias. Electrons, with their low mass, may respond quickly to RF fields,resulting in a fast electron flow to surfaces which in turn imparts anet negative dc bias to the (wafer) surface in contact with the plasma.The voltage difference between the plasma and the wafer surfaceaccelerates positive ions to the surface. The negative DC bias may beused to fine tune many features of the ashing process, such as ashingrate, anisotropy, angular/spatial selectivity and others. In someembodiments, a surface treatment of chemical additives may be applied tothe EPS before plasma ashing which may enhance DC bias application. Insome embodiments, the EPS may be placed in the presence of a gas such asa noble gas during plasma ashing. The noble gas may be argon. In someembodiments, the plasma ashing may be used to adjust at least one offringe shape and spatial variation of the polymer grating structure. Insome embodiments, the plasma ashing beam intensity may be variable toprovide spatially varying modulation depths. Angular variation of theintensity of the plasma ashing beam may be used for fringe shaping. Insome embodiments, the plasma ashing may be applied along more than oneintersecting direction for forming a photonic crystal. In someembodiments, a high functionality acrylate around the edge of thediffracting features may change the density of a diffracting feature ofthe EPS with the plasma ashing rate being controlled at a spatialresolution comparable to the EPS spatial frequency. The morphology ofthe EPS may be modified to improve grating performance and increase theefficiency of processes such as ashing, improve the grating definition,change the surface structure to reduce haze adding materials forincreasing the chemical affinity with gases present during the plasmaashing process, and/or change the effective refractive index of thegrating. In some embodiments, the modulation depth of the EPS may bedetermined by the plasma ashing time since the greater the plasma ashingtime the more material is removed.

In some embodiments, oxygen and/or fluorine may be used as reactivespecies in the plasma ashing process. In some embodiments, hydrogenplasmas may be used in the plasma washing process. In some embodiments,ashing rates in oxygen plasma may be controlled by additives in theHPDLC mixture such as nitrogen. In some embodiments, a plasma ashingprocess for ashing organic material may use a gas mixture of oxygen andNH₃. An oxygen based process may suffer from substrate surfaceoxidation. In some embodiments, the plasma ashing process may includeoxygen free plasmas which may include mixtures of nitrogen and hydrogento overcome surface oxidation. Such plasma mixtures may further comprisefluorine.

In some embodiments, post coating the EPSs with a very thin atomic layerof high index material can enhance the diffractive properties (e.g. therefractive index modulation) of the grating. The coating may be ametallic layer or a dielectric layer. One such process, Atomic LayerDeposition (ALD), involves coating the gratings with TiO₂ or ZnO₂ orsimilar. The coating may provide a grating structure that is more robustagainst temperature variations and various other environmentalconditions. The ALD process can also provide a large effective indexeven when the grating structures are made of lower index materials. Thistechnique may be similarly applied to the fabrication of nanoimprintedSRGs where a few nanometer thick ALD can protect the resin into whichthe SRG is stamped and can also improve the effective refractive indexmodulation. The use of Atomic Layer Deposition (ALD) on top of an EPSmay yield further performance improvement. In many embodiments, the dutycycle of the EPS might not be optimal for weak polymer networks. In someembodiments, the duty cycle of the EPS may be 30% polymer.

Various EPS manufacturing processes are described above in FIGS. 1A-1D.FIGS. 3A and 3B illustrate various EPSs after manufacturing. FIGS. 20Aand 20B illustrate various grating in accordance with an embodiment ofthe invention. The grating includes many identically numbered elementsto those of FIGS. 3A and 3B. The description of these elements of FIGS.3A and 3B are applicable to the gratings of FIGS. 19A and 19B and willnot be repeated in detail. The gratings may be EPSs which aremanufactured using processes described in connection with FIGS. 1A-1Dand FIG. 2. The gratings may also be hybrid gratings which aremanufactured using processes described in connection with FIGS. 4A-4Eand 5. As illustrated in FIGS. 19A and 19B, the grating may include acoating 1902. The coating 1902 may be present on the horizontal surfacessuch as the top of the polymer regions 3004 a and the substrate 3002. Asillustrated, FIG. 19B includes an optical layer 3008 which is indirection contact with the substrate 3002 such that the optical layer3008 is positioned between the polymer regions 3004 a and the substrate3002. The coating 1902 may be positioned on the optical layer 3008. Thecoating 1902 may be deposited using a process such as ALD. The coating1902 may not have step coverage and thus only be deposited on thehorizontal surfaces such as the top of the polymer regions 3004 a andthe substrate 3002 or optical layer 3008. In some embodiments, thecoating 1902 may be deposited using a process that includes stepcoverage such that the coating 1902 is present on the sidewalls of thepolymer regions 3004 a. In some embodiments, the coating 1902 may beTiO₂ or ZnO₂. The coating 1902 may be multilayered to include multipledifferent layered materials. In some embodiments, an additionalpassivation coating may be applied to the surfaces of the polymergrating structure over the coating 1902. The additional passivationcoating may provide environmental protection (e.g. protection frommoisture and/or contamination).

In some embodiments, the coating 1902 may be present on the substrate3002 or optical layer 3008 and not the top of the polymer regions 3004a. FIG. 20C illustrates a grating in accordance with an embodiment ofthe invention. The grating includes many identically numbered elementsto those of FIGS. 3A and 3B. The description of these elements of FIGS.3A and 3B are applicable to the gratings of FIG. 20C and will not berepeated in detail. As illustrated, the grating of FIG. 20C includes acoating 1902 similar to FIGS. 20A and 19B. However, the coating 1902 isonly present on the substrate 3002 and not the tops of the polymerregions 3004 a as is the case in FIGS. 20A and 20B. In embodiments withan optical layer 3008, the coating 1902 may only be present on theoptical layer 3008 and not on the tops of the polymer regions 3004 a. Insome embodiments, the coating 1902 may be removed off the tops of thepolymer regions 3004 a or the coating 1902 may be selectively depositedon the substrate 3002. The coating 1902 may function as a bias layersimilar to the optical layer 3008.

Embodiments Including Slanted EPSs

In some embodiments, the gratings include slanted EPSs making up slantedgratings. Slanted gratings can be configured as binary gratings, blazedgratings, and/or multilevel gratings and other structures. Slantedgratings may couple monochromatic angular light into waveguides withhigh diffraction efficiency. They also allow angular content to bemanaged more efficiency once the light is inside the waveguide. Whenconfigured with stepwise or continuously spatially varying K-vectors theangular bandwidth that can be coupled into a waveguide may be increased.

Embodiments Including Eyeglow Suppression

In waveguide-based displays light may be diffracted toward the user andalso away from the user. Eye glow may include unwanted light emergingfrom the front face of a display waveguide (e.g. the waveguide facefurthest from the eye) and originating at a reflective surface of theeye, a waveguide reflective surface and a surface of grating (due toleakage, stray light diffractions, scatter, and other effects). Thelight that is diffracted away is commonly called “eye-glow” and poses aliability for security, privacy, and social acceptability. “Eye glow”may refer to the phenomenon in which a user's eyes appear to glow orshine through an eye display caused by leakage of light from thedisplay, which creates an aesthetic that can be unsettling to somepeople. In addition to concerns regarding social acceptability in afashion sense, eye glow can present a different issue where, when thereis sufficient clarity to the eye glow, a viewer looking at the user maybe able to see the projected image intended for only the user. As such,eye glow can pose a serious security concern for many users. Adiscussion of various eyeglow suppression systems is discussed in detailin WO 2021/242898, entitled “Eye Glow Suppression in Waveguide BasedDisplays” and filed May 26, 2021, which is hereby incorporated byreference in its entirety for all purposes.

FIGS. 21A-21C conceptually illustrate three embodiments of waveguides inwhich evanescent coupling into a grating can occur. In theseembodiments, a grating layer 2004 is positioned on a substrate 2002. InFIG. 21A, two identical substrates 2002, 2006 sandwich the grating layer2004. In FIG. 21B, a thin substrate 2006 a and a thick substrate 2006sandwich the grating layer 2004. In FIG. 21C, a thick substrate 2002supports the grating layer 2004 without the presence of a top substrate.The top substrate 2006, 2006 a may be a cover substrate or coating. Inother embodiments, a thin protective coating can be applied to thegrating layer 2004. The upper surface of each the waveguide embodimentsfaces the user's eye. The grating layer 2004 may eject light 2010 fromthe waveguide towards the user's eye. Unwanted eyeglow light 2008 mayalso be ejected towards the environment as illustrated in the cases ofFIGS. 21A and 21B.

Eyeglow and/or light leakage can be reduced from the opposing outersurface by eliminating the top substrate as illustrated in FIG. 21C. Theelimination of an upper substrate may result in less eyeglow/lightleakage than the other two embodiments. Note that, in each embodimentillustrated, all rays shown undergoing TIR are at TIR angles that may beevanescently coupled to the grating layer 2004. Zero order light raysare indicated by dashed lines. In some embodiments, the evanescentgrating coupling may result in eyeside output light substantially normalto the waveguide, as shown.

Where the grating average refractive index is lower than the substrates,then for high angles (far from TIR) where only evanescent coupling canoccur, zero order TIR light cannot pass through the grating layer 2004to TIR off both air interfaces. Light propagating in TIR can thereforeget trapped on one side of the grating or the other. Grating depth inthe thickness of the waveguide may affect the amount of light that iscoupled to the desired eyeside, and the undesired non-eye side wherelight is lost as eyeglow/light leakage. In some embodiments, evanescentcoupling may result in at least a portion of the coupled light beingconverted to guided modes within at least one the grating and the eyeside waveguide substrate 2006, 2006 a. The evanescent coupling behaviorsmay be a function of the TIR angle, grating thickness, modulation,average index and the index and thickness of the eyeside substrate 2006,2006 a.

In some embodiments, a slanted EPS may also provide eyeglow suppression.One advantage to the use of EPSs in the context of eyeglow suppressionand other stray light control applications such as glint suppression, isthat a variety of grating types can be implemented on a waveguidesubstrate to provide different types of beam angular selectivity fordealing with the stray light present in various regions of thewaveguide. In some regions of a waveguide where wide angle capability isdesired, an EPS may be configured as a Raman-Nath grating, which mayhave a modulation depth less than the grating pitch across at least aportion of the polymer grating structure. In other regions where highdiffraction efficiency for certain beam angles is required, an EPS mayoperate in the Bragg regime.

Embodiments Including Inverse Gratings

In some embodiments, the gratings disclosed in connection with FIGS. 20Aand 20B may be used to create inverse gratings. These inverse gratingsmay be thin film gratings. FIGS. 22A-22D illustrate various stages ofmanufacturing an inverse grating in accordance with an embodiment of theinvention. The various stages of manufacturing includes many identicallynumbered elements to those of FIGS. 3A, 3B, 20A, and 20B. Thedescription of these elements of FIGS. 3A, 3B, 20A, and 20B areapplicable to the gratings of FIG. 20C and will not be repeated indetail. FIG. 22A corresponds to the structure created in FIG. 1B whichincludes polymer regions 3004 a separated by phase separated material2102. The phase separation grating may be formed from a mixture ofmonomer and a second component deposited onto the substrate 3002 usingthe recording process described above. The second component can includea liquid crystal or a suspension of nanoparticles. Other materialscapable of phase separation can be used. After exposure, a grating maybe created including alternating fringes rich in polymer and fringesrich in the second component.

In FIG. 22B, the phase separated material 2102 is removed to create airgap regions 3004 b to create an EPS. The EPS structure created in FIG.22B corresponds to the EPS structure in FIG. 3A. In this step, thesecond component can be removed to form a polymer surface relief gratingincluding polymer regions separated by air spaces.

In FIG. 22C, a coating 1902 is applied to the surfaces of the substrate3002 and the tops of the polymer regions 3004 a. In some embodiments,the coating 1902 may be applied through an ALD process. The structurecreated in FIG. 22C corresponds to the structure in FIG. 19A. In someembodiments, the air regions 3004 b can be at least partially backfilledwith a material of refractive index differing from that of the polymerregions 3004 a. The backfilling can be performed by applying an ALDcoating similar to the one described above. In some embodiments, the ALDcoating may be higher thickness than the thin coatings described inconnection with FIGS. 20A-20C. Other methods of backfilling the gratingmay be used depending on the type of material and the thickness ofbackfilled layer. The backfill material can have an index higher orlower than that of the polymer regions 3004 a, according to the intendedgrating application. At the end of this step, the polymer surface reliefgrating may be partially filled with the backfill material as shown inFIG. 22C. As illustrated, some of the backfill material may adhere tothe top faces of the polymer regions 3004 a. Some of the backfillmaterial may also adhere to the upper portions of the polymer regions3004 a.

In FIG. 22D, the polymer regions 3004 a are removed. The coating 1902 onthe tops of the polymer regions 3004 a is removed as well. The remainingcoating 1902 disposed on the substrate 3002 may be used as an inversegrating. The remaining coating 1902 alternates with air regions 2104. Inthis step, the polymer regions 3004 a and unwanted coating 1902 can beremoved using an etching process such as a plasma ashing process toreveal a slanted Bragg surface relief grating composed of the coating1902 supported by the substrate 3002. In some embodiments, the polymerregions 3004 a may be removed through a plasma ashing technique. Theinverse grating may be a thin film Bragg surface relief grating.

Embodiments for Fabricating a Surface Relief Grating with ImprovedGrating Definition

One strategy for reducing haze is to reduce the surface roughness ofSRGs. In many embodiments, a composite grating with improved surfacedefinition, e.g. low surface roughness. FIG. 23A illustrates a schematicrepresentation of a grating in accordance with an embodiment of theinvention. In a first step, the grating may be formed using phaseseparation of a starting mixture including a material A and a material Busing the procedures discussed earlier. Material A may be a polymer.After curing of the grating, component B may be extracted to leave agrating including high index regions containing voids 2301 embedded inpolymer 2302 and low index regions containing a weak polymer structureand other residues resulting from incomplete phase separation. Thepolymer structure and other residues may be further removed using aprocess such as plasma ashing to leave air regions 2303.

FIG. 23B illustrates a schematic representation of a grating inaccordance with an embodiment of the invention. The grating may bemanufactured with a process starting with the process described inconnection of FIG. 23A. In a next step, the grating is immersed in amaterial C which fills the voids 2304 and air regions 2305. The materialC may be cured using a process such as UV exposure.

FIG. 23C illustrates a schematic representation of a grating inaccordance with an embodiment of the invention. The grating may bemanufactured with a process starting with the process described inconnection of FIG. 23B. In a next step, material C may be removed fromthe gap regions by a process such as plasma ashing to leave compositepolymer and material C regions 2306 separated by air gaps 2307. Theplasma ashing step may be separate from the plasma ashing step describedin connection with FIG. 30A. After plasma ashing, the composite materialmay have a smoother surface the polymer 2302 described in connectionwith FIG. 23A. Material A and material C may provide a refractive indexcontrast that is low enough to minimise scattering while providing adesired refractive index modulation.

In many embodiments bulk scatter may be strongly influenced by therefractive index contrast within the high index region while surfacescattering may be dependent on the surface texture. In many embodiments,by filling surface voids as in the process discussed in FIGS. 23A-23C incombination with ashing may result in a smoother surface structure. Inmany embodiments, the above process may be used to eliminate the bulkscatter contributions that may arise from voids within the polymerregions 2304.

FIG. 24 illustrates an example process flow for fabricating SRGs inaccordance with an embodiment of the invention. In a first step, agrating structure may be formed 2410 using a phase separation processutilizing a starting mixture including a material A and a material B.After phase separation, there may be a material A rich region and amaterial B rich region. In a second step which includes a first ashingstep, material B may be extracted (2411) to leave a grating structureincluding high index regions containing voids embedded in polymer andindex regions containing a residual polymer matrix. The material B richregions may become an air regions after the first ashing step. In athird step, the grating structure may be immersed (2412) in a material Cto fill the voids in the polymer rich regions and air regions. In afourth step, the material C may be extracted (2413), using a secondashing step, to remove material C from the previous air regions to leavea composite polymer and material C region separated by air gaps. Asdescribed previously, this may result in a lower surface roughness inthe fabricated SRGs. In some embodiments, the SRGs may be deep SRGs asdiscussed previously.

Surface Relief Gratings Configured as Dual Interaction Gratings

In conventional Bragg gratings, dual interaction can be understood usingbasic ray optics by considering upwards and downward TIR rayinteractions with a fold grating. The upward and downwards raysoccurring when guided light is reflected at the lower and upperwaveguide TIR surfaces. The two ray paths give rise to two shifteddiffraction efficiency vs angle characteristics which combine to extendthe angular bandwidth. Examples of an optical waveguide including atleast two TIR surfaces and containing a grating of a first prescriptionconfigured such that an input TIR light with a first angular range alonga first propagation direction undergoes at least two diffractions withinsaid grating and undergoes a change in propagation direction from saidfirst propagation direction to a second propagation direction, whereineach ray from said first angular range and its corresponding diffractedrays lie on a diffraction cone of said grating, wherein each diffractionprovides a unique TIR angular range along said second propagationdirection are disclosed in U.S. Pat. No. 9,632,226, entitled “WaveguideGrating Device” and filed Feb. 12, 2015, which is incorporated herein byreference in its entirety for all purposes.

FIGS. 25A and 25B illustrate the principles of a dual interactiongrating for implementation in a waveguide. The waveguide 30 includesgrating fringes 31 slanted with respect to the waveguide TIR faces andaligned at a clocking angle within the waveguide plane. In manyembodiments clocking angle may be 45 degrees to provide a 90 degree beamdeflection. In FIG. 25A, a first TIR path lies in the input propagationplane 2020 and, after diffraction in the output propagation plane 2021.The grating has a k-vector 2022 also labelled by the symbol k. The tiltangle 2023 of the grating fringes relative to the waveguide surfacenormal 2024 is also indicated. TIR light 2025 in the propagation plane2001 having a TIR angle 2026 relative to the waveguide plane normal 2027strikes the grating fringe as an upward-going ray 2028 which isdiffracted into the TIR direction 2029 lying inside the propagationplane 2021. In FIG. 25B, a second TIR path in the input propagationplane 2001 indicated by 2030 has a TIR angle 2031 relative to thewaveguide plane normal 2027 strikes the grating fringe as adownward-going ray 2033 which is diffracted into the TIR direction 2034lying inside the output propagation plane 2021. Since the upward-goingand downward-going TIR rays are asymmetric in this case there may be twopeaks in the output diffraction efficiency versus angle characteristics.

FIG. 26 conceptually illustrates a cross section of a grating inaccordance with an embodiment of the invention. The grating may be a SRG2100 including slanted fringes 2101 separated by air volumes 2103. Inmany embodiments, the gratings may be clocked or slanted within thewaveguide plane. FIG. 27 is a conceptual representation of beampropagation with the grating of FIG. 26. The grating is represented as aconfiguration 2110 which for conceptual purposes may be divided up intoa deep grating portion 2111 including alternating high index fringes2113 and low index fringes 2114, which operates in the Bragg regime,overlaid by a thin grating portion 2112 including alternating high indexregions 2115 and low index regions 2116 which operates in the Raman-Nathregime. In many embodiments, the high index regions 2115 are polymer andthe low index regions 2116 are air. The grating configuration 2110supports TIR beam propagation include ray paths such as 2117. Tosimplify the explanation of the embodiment the guided ray reflection asrepresented by the rays 2118,2119, is represented as taking place at theinterface of the volume grating portion 2111 and the thin gratingportion 2112. A reasonable approximation of the TIR at the thin gratingportion 2112 may be considered separated from the coupled wavepropagation through the volume grating portion 2112.

In some embodiments, the thick grating portion 2112 may be partiallybackfilled with a different refractive index material up to the level ofthe thin grating portion 2112 and thick grating portion 2111 interface.FIG. 28 illustrates an example of a partially backfilled grating 2121 inaccordance with an embodiment of the invention. This partiallybackfilled grating 2121 may be considered a hybrid surface reliefgrating/volume Bragg grating. The backfilled grating 2121 is the gratingdescribed in connection with FIG. 27 that has been backfilled with adifferent refractive index material. The backfilled grating 2121 may beconsidered a volume grating. In many embodiments, the unfilled regionsthat remain after partial backfilling of the air regions may provide apolymer Raman-Nath surface relief grating 2802 including alternatingpolymer regions and air regions overlaying a Bragg grating 2804comprising alternating polymer regions and backfilled material regions.In a waveguide implementation the upward and downward TIR propagationdirections may be produced by TIR at the waveguide to air interfaces.

The dual interaction illustrated in FIGS. 25A-25B may include upward anddownward propagating TIR rays. In an SRG, one of the TIR propagationdirections results from the reflective diffraction at the SRG takingplace at an angle equal to the TIR angle. The SRG may allow diffractionTIR to take place with high efficiency subject to some constraints onthe ranges of incidence angles, K-vector directions, grating clockangles, grating period, and/or grating thickness. In some embodiments,the SRG may be a fold grating. Hence a first TIR propagation direction2119 produced by the surface grating and an opposing TIR propagationdirection 2120 produced by reflection from the opposite face of thegrating substrate may interact within the volume grating portion shownin FIG. 28. In many embodiments, this ray-grating interaction may resultin a dual interaction according to the embodiments and teachings of U.S.Pat. No. 9,632,226 which is hereby incorporated by reference in itsentirety for all purposes. The grating diffraction efficiency may bedependent on the at least one of the guide beam angular bandwidth,grating vector, grating thickness, and/or grating fringe spacing. Insome embodiments, the thick grating portion 2111 may be eliminated toprovide only the thin surface relief grating portion 2112 supported by atransparent substrate.

Hybrid surface relief grating/volume Bragg grating structures may offerseveral advantages including wider cumulative angular response which, inmany embodiments, may allow thicker gratings to be used for improving DEwithout compromising angular bandwidth. Coating the hybrid gratings withan ALD coating to increase the effective index may further enhance theangular bandwidth. In many embodiments, the hybrid surface reliefgrating/volume Bragg grating structures may improve the diffractionefficiency for P-polarized light. In some embodiments, a hybrid surfacerelief grating/volume Bragg grating structures formed by phaseseparating a mixture of an inorganic component and a monomer may includefully inorganic SRG after complete removal of the final polymercomponent from the cured grating. In many embodiments the inorganiccomponent may be nanoparticles. In many embodiments, a hybrid surfacerelief grating/volume Bragg grating structures may be used in at leastone of a fold grating and/or an output grating to reduce haze and toreduce coupling losses in a fold grating. Reducing haze may increasecontrast. Reducing coupling losses in the fold grating may be equivalentto increasing diffraction efficiency in the fold grating. In manyembodiments, a polymer/air SRG may be used as an input grating with highdiffraction efficiency.

As illustrated previously, hybrid surface relief grating/volume Bragggrating structures may be formed by partial back filling of a gratingstructure to form a structure comprising a volume Bragg grating with anoverlaid surface relief grating. Hybrid surface relief grating/volumeBragg grating structures may show improved angular response after anadditional plasma ashing or reactive ion etch.

In many embodiments, hybrid surface relief grating/volume Bragg gratingstructures may be formed during holographic phase separation and curing.In many embodiments, the grating may be formed in a cell in which thegrating material is sandwiched by a base substrate and a release layer.The surface structure may be revealed when the release layer is removed.Without limitation to any particular theory, the surface grating may beformed because of polymerization induced shrinkage during to massmigration and phase separation. The relative depths of high and lowindex regions can be adjusted by utilizing an additional plasma ashingstep. An ALD deposited layer can be added to the grating surface toincrease effective index. In many embodiments, the grating thickness maybe 1.1 microns with a grating period of 375 nm and a 22-degree slantangle (relative to the cell optical surface normal). The finishedgratings may be isotropic or anisotropic depending on the systemcomponents in the initial mixture.

FIG. 29 schematically illustrates a ray-grating interaction geometry2130 of a TIR surface grating. Such configurations are commonly referredto as conical diffraction configurations. For a TIR grating recorded ona transparent substrate of refractive index n_(S) immersed in a lowindex medium of index n₀ (which in many embodiments will be air) but canbe any medium satisfying the relation n_(S)>n₀, only reflecteddiffracted orders exist for rays that satisfy the relationn_(S)/n₀≤|sin(u_(inc))|≤1. Referring to the xyz Cartesian referenceframe in FIG. 28, the equations relating incident and diffracted rayangles to the grating vectors may be expressed as follows:

x direction: −k n _(S) sin(u _(inc))+K _(S) cos(φ_(s))=−k n _(S) sin(u_(diff))cos(φ_(diff));

y direction: K _(S) sin(φ_(s))=k n _(S) sin(u _(diff))sin(φ_(diff)); and

z direction: k n _(S) cos(u _(inc))=k n _(S) cos(u _(diff))+K_(S)/tan(φ_(s)).

where u_(inc) is the polar angle of the incident ray vector r _(inc),φ_(s) is the azimuth angle of the incident ray, u_(diff) is the polarangle of the diffracted ray vector r _(diff), φ_(s) is the azimuth angleof the grating vector, and us is the polar angle of the grating vectorK.

The wavenumber k of the incident light may be provided by k=2π/λ, whereλ is the wavelength of the guided light. The modulus of the surfacecomponent of the grating vector is given by K_(S)=k=2π/∧_(S) where ∧_(S)is the surface grating pitch. Solutions to the above equations may beobtain by setting the incidence angle equal to the diffracted angle.

In many embodiments, the dual interaction grating is implemented in apolymer grating structure comprising alternating polymer rich and airregions. In many embodiments, the grating depth of the polymer gratingstructure is less than the Bragg fringe spacing. In many embodiments,the grating depth of the polymer grating structure is greater than theBragg fringe spacing. In many embodiments, the total internal reflectionfrom the polymer grating structure occurs when the first orderdiffraction from the polymer grating structures has a diffraction angleequal to the TIR angle of the waveguide. In many embodiments, thepolymer grating structure provides no transmitted diffraction orders. Inmany embodiments, the polymer grating structure is a photonic crystal.In many embodiments, the polymer grating structure is configured as aRaman Nath grating having a first grating period overlaying a Bragggrating having the same grating period with the minima of the Raman Nathgrating overlaying the minima of the Bragg grating. In many embodiments,the polymer grating structure is a slanted grating. In many embodiments,the air regions of polymer grating structure may be at least partiallybackfilled with a material having a refractive index different than thatof the polymer rich regions.

Embodiments Including OLED Arrays as Image Generators

There is growing interest in the use of Organic Light Emitting Diode(OLED) arrays as image generators in waveguide displays. OLEDs have manyadvantages in waveguide display applications. As an emissive technology,OLEDs require no light source. OLEDs can be printed cost—effectivelyover large areas. Non-rectangular pixel array patterns can be printedonto curved or flexible substrates. As will be discussed below, theability to pre-distort a pixel array and create a curved focal planeadds a new design dimension that can enable compensation for guided beamwavefront distortions caused by curved waveguides and prescriptionlenses supported by a waveguide. OLEDs with resolutions of 4K×4K pixelsare currently available with good prospects of higher resolution in thenear term, offering a faster route to high resolution, wide FOV ARdisplays than can be provided by technologies such as Liquid Crystal onSilicon (LCoS) and Micro Electro Mechanical Systems (MEMS) devices suchas digital light processing (DLP) devices. Another significant advantageover LCoS is that OLEDs can switch in microseconds (compared withmilliseconds for LC devices).

OLEDs have certain disadvantages. In their basic form, OLEDs areLambertian emitters, which makes efficient light collection much morechallenging than with LCoS and DLP micro displays. The red, green, andblue spectral bandwidths of OLEDs are broader than those of LightEmitting Diodes (LEDs), presenting further light management problems inholographic waveguides. The most significant disadvantage of OLEDs isthat in waveguides using HPDLC periodic structures such as switchableperiodic structures, which tend to be P-polarization selective, half ofthe available light from the OLED is wasted. As such, many embodimentsof the invention are directed towards waveguide displays for use withemissive unpolarized image sources that can provide high lightefficiency for unpolarized light and towards related methods ofmanufacturing such waveguide displays.

For the purposes of describing embodiments, some well-known features ofoptical technology known to those skilled in the art of optical designand visual displays have been omitted or simplified in order to notobscure the basic principles of the invention. Unless otherwise stated,the term “on-axis” in relation to a ray or a beam direction refers topropagation parallel to an axis normal to the surfaces of the opticalcomponents described in relation to the invention. In the followingdescription the terms light, ray, beam, and direction may be usedinterchangeably and in association with each other to indicate thedirection of propagation of electromagnetic radiation along rectilineartrajectories. The term light and illumination may be used in relation tothe visible and infrared bands of the electromagnetic spectrum. Parts ofthe following description will be presented using terminology commonlyemployed by those skilled in the art of optical design. As used herein,the term grating may encompass a grating comprised of a set of gratingsin some embodiments. For illustrative purposes, it is to be understoodthat the drawings are not drawn to scale unless stated otherwise.

Turning now to the drawings, methods and apparatus for providingwaveguide displays using emissive input image panels in accordance withvarious embodiments of the invention are illustrated. FIG. 30conceptually illustrates a waveguide display in accordance with anembodiment of the invention. As shown, the apparatus 100 includes awaveguide 101 supporting input 102 and output 103 gratings with highdiffraction efficiency for P-polarized light in a first wavelength bandand input 104 and output 105 gratings with high diffraction efficiencyfor S-polarized light in the first wavelength band.

The apparatus 100 further includes an OLED microdisplay 106 emittingunpolarized light with an emission spectral bandwidth that includes thefirst wavelength band and a collimation lens 107 for projecting lightfrom the OLED microdisplay 106 into a field of view. In the illustrativeembodiment, the S and P diffracting gratings 102-105 can be layered withno air gap required. In other embodiments, the grating layers can beseparated by an air gap or a transparent layer. The S and P diffractinggratings 102-105 may be the deep SRGs or EPSs described above.

FIG. 31 conceptually illustrates a waveguide display in accordance withan embodiment of the invention in which the P-diffracting andS-diffracting gratings are disposed in separate air-spaced waveguidelayers. As shown, the apparatus 110 comprises upper 111 and lower 112waveguide layers (supporting the gratings 102,103 and 104,105,respectively) separated by an air gap 113. The gratings 102,103 and104,105 may be the deep SRGs and EPSs described above.

FIG. 32 conceptually illustrates typical ray paths in a waveguidedisplay in accordance with an embodiment of the invention. In theembodiment 120 illustrated in FIG. 32, a microdisplay 106 is configuredto emit unpolarized light 121 in a first wavelength band, which iscollimated and projected into a field of view by a collimator lens 107.The S-polarized emission from the microdisplay 106 can be coupled into atotal internal reflection path in a waveguide 101 by an S-diffractinginput grating 104 and extracted from the waveguide 101 by anS-diffracting output grating 105. P-polarized light from themicrodisplay 106 can be in-coupled and extracted using P-diffractinginput and output gratings 102,103 in a similar fashion. Dispersion canbe corrected for both S and P light provided that the input and outputgratings spatial frequencies are matched. The input and output gratings102,103 may be the deep SRGs or EPSs described above.

Although FIGS. 23-25 show specific waveguide display configurations,various configurations including modifications to those shown can beimplemented, the specific implementation of which can depend on thespecific requirements of the given application. Furthermore, suchdisplays can be manufactured using a number of different methods. Forexample, in many embodiments, the two grating layers are formed using aninkjet printing process.

In many embodiments, the waveguide operates in a monochrome band. Insome embodiments, the waveguide operates in the green band. In severalembodiments, waveguide layers operating in different spectral bands suchas red, green, and blue (RGB) can be stacked to provide a three-layerwaveguiding structure. In further embodiments, the layers are stackedwith air gaps between the waveguide layers. In various embodiments, thewaveguide layers operate in broader bands such as blue-green andgreen-red to provide two-waveguide layer solutions. In otherembodiments, the gratings are color multiplexed to reduce the number ofgrating layers. Various types of gratings can be implemented. In someembodiments, at least one grating in each layer is a switchable periodicstructure.

The invention can be applied using a variety of waveguidesarchitectures, including those disclosed in the literature. In manyembodiments, the waveguide can incorporate at least one of: anglemultiplexed gratings, color multiplexed gratings, fold gratings, dualinteraction gratings, rolled K-vector gratings, crossed fold gratings,tessellated gratings, chirped gratings, gratings with spatially varyingrefractive index modulation, gratings having spatially varying gratingthickness, gratings having spatially varying average refractive index,gratings with spatially varying refractive index modulation tensors, andgratings having spatially varying average refractive index tensors. Insome embodiments, the waveguide can incorporate at least one of: a halfwave plate, a quarter wave plate, an anti-reflection coating, a beamsplitting layer, an alignment layer, a photochromic back layer for glarereduction, louvre films for glare reduction In several embodiments, thewaveguide can support gratings providing separate optical paths fordifferent polarizations. In various embodiments, the waveguide cansupport gratings providing separate optical paths for different spectralbandwidths. In a number of embodiments, gratings for use in theinvention can be HPDLC gratings, switching gratings recorded in HPDLC(such switchable Bragg Gratings), Bragg gratings recorded in holographicphotopolymer, or surface relief gratings.

In some embodiments, the EPS may be a dual axis expansion grating foruse in a display waveguide. In Bragg gratings, dual interaction can beunderstood using basic ray optics by considering upwards and downwardTIR ray interactions with a fold grating, the upward and downwards raysoccurring when guided light is reflected at the lower and upperwaveguide TIR surfaces. In an EPS, one of the TIR interfaces is replacedby the grating. Using diffraction grating theory, it can be shown that aSRG (and a SRG fold in particular) may allow the diffraction angle intofirst order to equal the incidence angle such that TIR can take placesubject to some constraints on the ranges of incidence angles, K-vectordirections, grating clock angles, grating depths and grating periods.Hence upward and downward TIR paths through the grating exist for SRGs.Increasing the SRG thickness into the Bragg domain, dual interaction mayoccur in an EPS in the same way as in a volume Bragg grating. Thus,various embodiments of the invention pertain to a dual interaction EPS.

In many embodiments, the waveguide display can provide an image field ofview of at least 50° diagonal. In further embodiments, the waveguidedisplay can provide an image field of view of at least 70° diagonal. Insome embodiments, an OLED display can have a luminance greater than 4000nits and a resolution of 4 k×4 k pixels. In several embodiments, thewaveguide can have an optical efficiency greater than 10% such that agreater than 400 nit image luminance can be provided using an OLEDdisplay of luminance 4000 nits. Waveguide displays implementingP-diffracting gratings typically have a waveguide efficiency of 5%-6.2%.Providing S-diffracting gratings as discussed above can increase theefficiency of the waveguide by a factor of 2. In various embodiments, aneyebox of greater than 10 mm with an eye relief greater than 25 mm canbe provided. In many embodiments, the waveguide thickness can be between2.0-5.0 mm.

FIG. 33 conceptually illustrates a waveguide display in accordance withan embodiment of the invention in which at least one portion of at leastone of the waveguide optical surfaces is curved and the effect of thecurved surface portion on the guided beam wavefronts. As shown, theapparatus 130 includes a waveguide 131 supporting the curved surfaceportion 132. In the illustrative embodiment, the waveguide 131 supportsinput 102 and output 103 gratings with high diffraction efficiency forP-polarized light in a first wavelength band and input 104 and output105 gratings with high diffraction efficiency for S-polarized light inthe first wavelength band. The microdisplay 106, which displays arectangular array of pixels 133 emits unpolarized light 134 in the firstwavelength band, which is collimated and projected into a field of viewby a collimator lens 107. The P-polarized emission from the microdisplay106 can be coupled into a total internal reflection path into thewaveguide by the P-diffracting input grating 102 and extracted from thewaveguide by the P-diffracting output grating 103. The presence of anynon-planar surface in a waveguide can distort the waterfronts of theguided light such that the output light when viewed from the eyeboxexhibits defocus, geometric distortion, and other aberrations. Forexample, in FIG. 33, the light projected by the collimator lens 107 froma single pixel has planar wavefronts 135, which after propagatingthrough the waveguide 131 along the TIR path 136 forms non-paralleloutput rays 137-139 that are normal to the curved output wavefront 139A.On the other hand, a perfect planar waveguide would instead provideparallel beam expanded light. FIG. 34 conceptually illustrates a version140 of the waveguide in which the waveguide substrate 141 supports twooverlapping upper 142 and lower 143 curved surfaces.

FIG. 35 conceptually illustrates a waveguide display in accordance withan embodiment of the invention in which the aberrations introduced by acurved surface portion can be corrected by pre-distorting the pixelpattern of the OLED microdisplay. In the illustrative embodiment, thewaveguide apparatus 150 is similar to the one illustrated in FIG. 25. Asshown, the apparatus 150 includes a microdisplay 151 that supports apre-distorted pixel pattern 152. Unpolarized first wavelength light 153emitted by the microdisplay is focused by the lens 107, whichsubstantially collimates the beam entering the waveguide while formingwavefronts 154 that are pre-distorted by a small amount. Afterin-coupling and propagation 155 through the waveguide 131, thepredistorted wavefronts are focused by the curved surface 132 to formparallel output rays 156-158, which are normal to the planar outputwavefront 159.

FIG. 36 conceptually illustrates a waveguide display in accordance withan embodiment of the invention in which the aberrations introduced by acurved surface portion can be corrected by pre-distorting the pixelpattern of an OLED microdisplay formed on a curved substrate. The curvedmicrodisplay substrates can help to correct focus errors fieldcurvature, distortion, and other aberrations in association with thedistorted pixel pattern. In the illustrative embodiment, the waveguideapparatus 160 is similar to the one illustrated in FIG. 32. As shown,the curved substrate microdisplay 161 supports the pre-distorted pixelpattern 164. Unpolarized first wavelength light 163 emitted by themicrodisplay is focused by the lens 107 to form substantially collimatedguided beams with slightly pre-distorted wavefronts 164, which, afterin-coupling and propagation 165 through the waveguide 131, form paralleloutput rays 166-168 that are normal to the planar output wavefront 169.

Although FIGS. 32-36 show specific configurations of waveguides havingcurved surfaces, many other different configurations and modificationscan be implemented. For example, the techniques and underlying theoryillustrated in such embodiments can also be applied to waveguidessupporting eye prescription optical surfaces. In many embodiments,prescription waveguide substrates can be custom-manufactured usingsimilar processes to those used in the manufacture of eye prescriptionspectacles, with a standard baseline prescription being fine-tuned toindividual user requirements. In some embodiments, waveguide gratingscan be inkjet printed with a standard baseline prescription. In severalembodiments, the OLED display can be custom-printed with a pre-distortedpixel pattern formed. In various embodiments, the OLED display can beprinted onto a curved backplane substrate. In a number of embodiments,additional refractive or diffractive pre-compensation elements can besupported by the waveguide. In many embodiments, additional correctionfunctions can be encoded in at least one of the input and outputgratings. The input and output gratings may be the deep SRGs or EPSs orthe hybrid gratings described above and may be manufactured in themethods described in connection with FIGS. 1-5. The input and outputgratings may also have thicknesses described in connection with FIGS.6-8.

FIG. 37 is a flow chart conceptually illustrating a method forprojecting image light for view using a waveguide containingS-diffracting and P-diffracting gratings in accordance with anembodiment of the invention. As shown, the method 170 of forming animage is provided. Referring to the flow diagram, method 170 includesproviding (171) an OLED array emitting light in a first wavelengthrange, a collimation lens, and a waveguide supporting input and outputgratings with high diffraction efficiency for S-polarized light in afirst wavelength band and input and output gratings with highdiffraction efficiency for P-polarized light in the first wavelengthband. In some embodiments, the input and output gratings may be the deepSRGs, EPSs, or hybrid gratings discussed previously. Image light emittedby the OLED array can be collimated (172) using the collimation lens.S-polarized light can be coupled (173) into a total internal reflectionpath in the waveguide using the S-diffracting input grating. P-polarizedlight can be coupled (174) into a total internal reflection path in thewaveguide using the P-diffracting input grating. S-polarized light canbe beam expanded and extracted (175) from the waveguide for viewing.P-polarized light can be beam expanded and extracted (176) from thewaveguide for viewing.

FIG. 38 is a flow chart conceptually illustrating a method forprojecting image light for view using a waveguide supporting an opticalprescription surface and containing S-diffracting and P-diffractinggratings in accordance with an embodiment of the invention. As shown,the method 180 of forming an image is provided. Referring to the flowdiagram, method 180 includes providing (181) an OLED array with apredistorted pixel pattern emitting light in a first wavelength range, acollimation lens, and a waveguide supporting input and output gratingswith high diffraction efficiency for S-polarized light into a firstwavelength band and input and output gratings with high diffractionefficiency for P-polarized light in the first wavelength band andfurther providing (182) a prescription optical surface supported by thewaveguide. In some embodiments, the input and output gratings may be thedeep SRGs, EPSs, or hybrid gratings discussed previously. Image lightemitted by the OLED array can be collimated (183) using the collimationlens. S-polarized light can be coupled (184) into a total internalreflection path in the waveguide using the S-diffracting input grating.P-polarized light can be coupled (185) into a total internal reflectionpath in the waveguide using the P-diffracting input grating. Thepre-distorted wavefront can be reflected (186) at the prescriptionsurface. A planar wavefront can be formed (187) from the pre-distortedwavefront using the optical power of the prescription surface.S-polarized light can be beam expanded and extracted (188) from thewaveguide for viewing. P-polarized light can be beam expanded andextracted (189) from the waveguide for viewing.

Discussion of Embodiments Including Varied Pixel Geometries

The various apparatus discussed in this disclosure can be applied usingemissive displays with input pixel arrays of many different geometriesthat are limited only by geometrical constraints and the practicalissues in implementing the arrays. In many embodiments, the pixel arraycan include pixels that are aperiodic (non-repeating). In suchembodiments, the asymmetry in the geometry and the distribution of thepixels can be used to produce uniformity in the output illumination fromthe waveguide. The optimal pixel sizes and geometries can be determinedusing reverse vector raytracing from the eyebox though the output andinput gratings (and fold gratings, if used) onto the pixel array. Avariety of asymmetric pixel patterns can be used in the invention. Forexample, FIG. 39A conceptually illustrates a portion 230 of a pixelpattern comprising rectangular elements 230A-230F of differing size andaspect ratios for use in an emissive display panel in accordance with anembodiment of the invention. In some embodiments, the pixels array canbe based a non-repeating pattern based on a finite set of polygonal baseelements. For example, FIG. 39B conceptually illustrates a portion 240of a pixel pattern having Penrose tiles 240A-240J for use in an emissivedisplay panel in accordance with an embodiment of the invention. Thetiles can be based on the principles disclosed in U.S. Pat. No.4,133,152 by Penrose entitled “Set of tiles for covering a surface”which is hereby incorporated by reference in its entirety. Patternsoccurring in nature, of which honeycombs are well known examples, canalso be used in many embodiments.

In many embodiments, the pixels can include arrays of identical regularpolygons. For example, FIG. 39C conceptually illustrates a portion 250of a pixel pattern having hexagonal elements in accordance with anembodiment of the invention. FIG. 39D conceptually illustrates a portion260 of a pixel pattern having square elements 250A-250C in accordancewith an embodiment of the invention. FIG. 39E conceptually illustrates aportion 270 of a pixel pattern having diamond-shaped elements 270A-270Din accordance with an embodiment of the invention. FIG. 39F conceptuallyillustrates a portion 280 of a pixel pattern having isosceles triangleelements 280A-280H in accordance with an embodiment of the invention.

In many embodiments, the pixels have vertically or horizontally biasedaspect ratios. FIG. 39G conceptually illustrates a portion 290 of apixel pattern having hexagonal elements 290A-290C of horizontally biasedaspect ratio. FIG. 39H conceptually illustrates a portion 300 of a pixelpattern having rectangular elements 300A-300D of horizontally biasedaspect ratio in accordance with an embodiment of the invention. FIG. 39Iconceptually illustrates a portion 310 of a pixel pattern having diamondshaped elements 310A-310D of horizontally biased aspect ratio inaccordance with an embodiment of the invention. FIG. 39J conceptuallyillustrates a portion 320 of a pixel pattern having triangular elements320A-320H of horizontally biased aspect ratio in accordance with anembodiment of the invention.

In many embodiments, OLEDs can be fabricated with cavity shapes andmultilayer structures for shaping the spectral emission characteristicsof the OLED. In some embodiments microcavity OLEDs optimized to providenarrow spectral bandwidths can be used. In some embodiments, thespectral bandwidth can be less than 40 nm. In some embodiments, spectralbandwidth of 20 nm or less can be provided. In some embodiments, OLEDscan be made from materials that provide electroluminescent emission in arelatively narrow band centered near selected spectral regions whichcorrespond to one of the three primary colors. FIG. 40 conceptuallyillustrates a pixel pattern in which different pixels may have differentemission characteristics. In some embodiments, pixels may have differingspectral emission characteristics according to their position in thepixel array. In some embodiments, pixels may have differing angularemission characteristics according to their position in the pixel array.In some embodiments the pixels can have both spectral and angularemission characteristics that vary spatially across the pixel array. Thepixel pattern can be based on any of the patterns illustrated in FIGS.39A-39J. In many embodiments, pixels of different sizes and geometriescan be arranged to provide a spatial emission variation for controllinguniformity in the final image.

In many embodiments, OLEDs can have cavity structures designed fortransforming a given light distribution into a customized form. This istypically achieved by secondary optical elements, which can be bulky forwearable display application. Such designs also suffer from the problemthat they limit the final light source to a single permanent operationalmode, which can only be overcome by employing mechanically adjustableoptical elements. In some embodiments, OLEDs can enable real-timeregulation of a beam shape without relying on secondary optical elementsand without using any mechanical adjustment. In some embodiments, anOLED can be continuously tuned between forward and off axis principalemission directions while maintaining high quantum efficiency in anysetting as disclosed in an article by Fries (Fries F. et al, “Real-timebeam shaping without additional optical elements”, Light Science &Applications, 7(1), 18, (2018)).

An important OLED development, the “microcavity OLED”, may offerpotential for more controlled spectral bandwidths and emission angles insome embodiments. However, microcavity OLEDs are not yet ready forcommercial exploitation. In one embodiment (corresponding to a 2-microngrating with index modulation 0.1, an average index 1.65 and an incidentangle in the waveguide of 45 degrees) the diffraction efficiency of anSBG is greater than 75% over the OLED emission spectrum (between25%-of-peak points). Narrower bandwidth OLEDs using deeper cavitystructures will reduce bandwidths down 40 nm. and below.

Advantageously, the invention can use OLEDs optimized for use in theblue at 460 nm., which provides better blue contrast in daylight ARdisplay applications than the more commonly used 440 nm OLED as well asbetter reliability and lifetime.

In some embodiments, the emissive display can be an OLED full colorsilicon backplane microdisplay similar to one developed by KopinCorporation (Westborough, Mass.). The Kopin microdisplay provides animage diagonal of 0.99 inch and a pixel density of 2490 pixels per inch.The microdisplay uses Kopin's patented Pantile™ magnifying lenses toenable a compact form factor.

Although the invention has been discussed in terms of embodiments usingOLED microdisplays as an input image source, in many other embodiments,the invention can be applied with any other type of emissivemicrodisplay technology. In some embodiment the emissive microdisplaycan be a micro LED. Micro-LEDs benefit from reduced power consumptionand can operate efficiently at higher brightness than that of an OLEDdisplay. However, microLEDs are inherently monochrome Phosphorstypically used for converting color in LEDs do not scale well to smallsize, leading to more complicated device architectures which aredifficult to scale down to microdisplay applications.

Although polymer periodic structures have been discussed in terms of usewithin OLED array based waveguide displays, polymer periodic structureshave advantageous synergetic applications with other classes ofdisplays. Examples of these displays include image generators using anon-emissive display technology such as LCoS and MEMS based displays.While LCoS based displays typically emit polarized light which may makethe polarization based advantages of polymer grating structures lessapplicable, polymer grating structures may provide an advantageousefficiency and manufacturing cost savings over conventional imprintedgratings. Further, polymer grating structures may be applicable invarious other non-display waveguide-based implementations such aswaveguide sensors and/or waveguide illumination devices.

EXAMPLE EMBODIMENTS

Although many embodiments of the invention have been described indetail, it should be appreciated that the invention may be implementedin many other forms without departing from the spirit or scope of theinvention. For example, embodiments such as enumerated below arecontemplated:

Item 1: A method for fabricating a periodic structure, the methodcomprising:

providing a holographic mixture on a base substrate;

sandwiching the holographic mixture between the base substrate and acover substrate, wherein the holographic mixture forms a holographicmixture layer on the base substrate;

applying holographic recording beams to the holographic mixture layer toform a holographic polymer dispersed liquid crystal periodic structurecomprising alternating polymer rich regions and liquid crystal richregions; and

removing the cover substrate from the holographic polymer dispersedliquid crystal periodic structure, wherein the cover substrate hasdifferent properties than the base substrate to allow for the coversubstrate to adhere to the unexposed holographic mixture layer whilecapable of being removed from the formed holographic polymer dispersedliquid crystal periodic structure after exposure.

Item 2: The method of Item 1, further comprising removing at least aportion of the liquid crystal in the liquid crystal rich regions to forma polymer periodic structure.

Item 3: The method of Item 2, further comprising refilling the liquidcrystal rich regions with a backfill material.

Item 4: The method of Item 3, wherein the backfill material has adifferent refractive index than the refractive index of the remainingpolymer rich regions.

Item 5: The method of Item 3, wherein the backfill material comprises aliquid crystal material.

Item 6: The method of claim 5, wherein the liquid crystal material isdifferent from the liquid crystal removed from the liquid crystal richregions.

Item 7: The method of Item 2, wherein removing at least a portion of theliquid crystal comprises removing substantially all of the liquidcrystal in the liquid crystal rich regions.

Item 8: The method of Item 2, wherein removing at least a portion of theliquid crystal further comprises leaving at least a portion of theliquid crystal in the liquid crystal rich regions.

Item 9: The method of Item 2, wherein removing at least a portion ofliquid crystal comprises washing the holographic polymer dispersedliquid crystal grating with a solvent.

Item 10: The method of any one of the preceding items, wherein the basesubstrate comprises plastic.

Item 11: The method of Item 1, wherein a silicon oxide layer isdeposited on the base substrate.

Item 12: The method of any one of Items 1-6, wherein the base substratecomprises glass, quartz, or silica.

Item 13: The method of any one of items 1-6, wherein the cover substratecomprises plastic.

Item 14: The method of Item 10, wherein a silicon oxide layer isdeposited on the cover substrate.

Item 15: The method of any one of items 1-6, wherein the cover substratecomprises glass, quartz, or silica.

Item 16: The method of any one of the preceding Items, wherein anadhesion promotion layer is coated on top of the base substrate whichpromotes adhesion between the base substrate and the holographic polymerdispersed liquid crystal periodic structure.

Item 17: The method of Item 16, wherein the base substrate comprises aglass surface including hydroxyl groups and wherein a silane-basedreagent bonds with the hydroxyl group and the adhesion promotion layer.

Item 18: The method of any one of the preceding items, wherein a releaselayer is coated on top of the cover substrate which allows the coversubstrate to easily release from the holographic polymer dispersedliquid crystal periodic structure.

Item 19: The method of Item 18, wherein the cover substrate comprises aglass surface including hydroxyl groups and wherein the release layer isa silane based fluoro reactant which bonds with the hydroxyl groups.

Item 20: The method of any one of the preceding items, furthercomprising applying a protective substrate to the holographic polymerdispersed liquid crystal periodic structure, wherein the holographicpolymer dispersed liquid crystal periodic structure is positionedbetween the protective substrate and the base substrate.

Item 21: A method for fabricating periodic structures, the methodcomprising:

providing a first holographic mixture on a first base substrate;

sandwiching the first holographic mixture between the first basesubstrate and a cover substrate, wherein the first holographic mixtureforms a first holographic mixture layer on the first base substrate;

applying holographic recording beams to the first holographic mixturelayer to form a first holographic polymer dispersed liquid crystalperiodic structure comprising alternating polymer rich regions andliquid crystal rich regions;

removing the cover substrate from the holographic polymer dispersedliquid crystal periodic structure;

providing a second holographic mixture on a second base substrate;

sandwiching the second holographic mixture between the second basesubstrate and the cover substrate, wherein the second holographicmixture forms a second holographic mixture layer on the second basesubstrate; and

applying holographic recording beams to the second holographic mixturelayer to form a second holographic polymer dispersed liquid crystalperiodic structure comprising alternating polymer rich regions andliquid crystal rich regions.

Item 22: The method of Item 21, wherein the cover substrate hasdifferent properties than the first base substrate and second basesubstrate to allow for the cover substrate to adhere to the first andsecond unexposed holographic mixture layer while capable of beingremoved from the formed first and second holographic polymer dispersedliquid crystal periodic structure after exposure.

Item 23: The method of any one of Items 21 or 22, further comprisingremoving the cover substrate from the second holographic polymerdispersed liquid crystal periodic structure.

Item 24: The method of any one of Items 21-23, further comprisingremoving at least a portion of the liquid crystal in the liquid crystalrich regions of the first or second holographic polymer dispersed liquidcrystal periodic structure to form a polymer surface relief grating.

Item 25: The method of Item 24, further comprising refilling the liquidcrystal rich regions of the first or second holographic polymerdispersed liquid crystal periodic structure with a backfill material.

Item 26: The method of Item 25, wherein the backfill material has adifferent refractive index than the refractive index of the remainingpolymer rich regions.

Item 27: The method of Item 25, wherein the backfill material comprisesa liquid crystal material.

Item 28: The method of Item 27, wherein the liquid crystal material isdifferent from the liquid crystal removed from the liquid crystal richregions.

Item 29: The method of Item 24, wherein removing at least a portion ofthe liquid crystal comprises removing substantially all of the liquidcrystal in the liquid crystal rich regions.

Item 30: The method of Item 24, wherein removing at least a portion ofthe liquid crystal further comprises leaving at least a portion of theliquid crystal in the liquid crystal rich regions.

Item 31: The method of Item 24, wherein removing at least a portion ofliquid crystal comprises washing the holographic polymer dispersedliquid crystal grating with a solvent.

Item 32: The method of any one of Items 21-31, wherein the first basesubstrate and/or second base substrate comprises plastic.

Item 33: The method of Items 21-32, wherein a silicon oxide layer isdeposited on the first base substrate and/or second base substrate.

Item 34: The method of any one of Items 21-31, wherein the first basesubstrate and/or second base substrate comprises glass, quartz, orsilica.

Item 35: The method of any one of Items 21-31, wherein the coversubstrate comprises plastic.

Item 36: The method of Item 35, wherein a silicon oxide layer isdeposited on the cover substrate.

Item 37: The method of any one of Items 21-31, wherein the coversubstrate comprises glass, quartz, or silica.

Item 38: The method of any one of Items 21-31, wherein an adhesionpromotion layer is coated on top of the first base substrate whichpromotes adhesion between the first base substrate and the firstholographic polymer dispersed liquid crystal grating.

Item 39: The method of Item 38, wherein the first base substratecomprises a glass surface including hydroxyl groups and wherein asilane-based reagent bonds with the hydroxyl group and the adhesionpromotion layer.

Item 40: The method of Items 21-39, wherein a release layer is coated ontop of the cover substrate which allows the cover substrate to easilyrelease from the holographic polymer dispersed liquid crystal grating.

Item 41: The method of Item 40, wherein the cover substrate comprises aglass surface including hydroxyl groups and wherein the release layer isa silane based fluoro reactant which bonds with the hydroxyl groups.

Item 42: A device for fabricating a deep surface relief grating (SRG)comprising:

a holographic mixture sandwiched between a base substrate and a coversubstrate,

wherein the holographic mixture is configured to form a holographicpolymer dispersed liquid crystal grating comprising alternating polymerrich regions and liquid crystal rich regions when exposed to holographicrecording beams, and

wherein the base substrate and the cover substrate have differentproperties to allow the cover substrate to adhere to the unexposedholographic mixture layer while capable of being removed from the formedholographic polymer dispersed liquid crystal grating after exposure.

Item 43: The device of Item 42, wherein the base substrate comprisesplastic.

Item 44: The device of Item 43, wherein a silicon oxide layer isdisposed on the base substrate.

Item 45: The device of Item 42, wherein the base substrate comprisesglass, quartz, or silica.

Item 46: The device of Item 45, wherein the cover substrate comprisesplastic.

Item 47: The device of Item 46, wherein a silicon oxide layer isdisposed on the cover substrate.

Item 48: The device of Item 42, wherein the cover substrate comprisesglass, quartz, or silica.

Item 49: The device of any one of Items 42-48, wherein an adhesionpromotion layer is coated on top of the first base substrate whichpromotes adhesion between the first base substrate and the firstholographic polymer dispersed liquid crystal grating.

Item 50: The device of Item 49, wherein the first base substratecomprises a glass surface including hydroxyl groups and wherein asilane-based reagent bonds with the hydroxyl group and the adhesionpromotion layer.

Item 51: The device of any one of Items 42-50, wherein a release layeris coated on top of the cover substrate which allows the cover substrateto easily release from the holographic polymer dispersed liquid crystalgrating.

Item 52: The device of Item 51, wherein the cover substrate comprises aglass surface including hydroxyl groups and wherein the release layer isa silane based fluoro reactant which bonds with the hydroxyl groups.

Item 53: A waveguide device comprising:

a waveguide supporting a polymer grating structure for diffracting lightpropagating in total internal reflection in said waveguide,

wherein the polymer grating structure comprises:

-   -   a polymer regions;    -   air gaps between adjacent portions of the polymer regions; and    -   a coating disposed on the tops of the polymer regions and the        tops of the waveguide.

Item 54: The waveguide device of Item 53, wherein the coating comprisesan atomic layer deposition (ALD) deposited metallic layer or dielectriclayer to enhance evanescent coupling between the waveguide and thepolymer grating structure.

Item 55: The waveguide device of Item 53, wherein the coating comprisesan atomic layer deposition (ALD) deposited metallic layer or dielectriclayer to enhance the effective refractive index of the polymer gratingstructure.

Item 56: The waveguide device of Item 53, wherein the coating comprisesan atomic layer deposition (ALD) deposited metallic layer or dielectriclayer to enhance adhesion and/or perform as a bias layer.

Item 57: The waveguide device of Item 53, wherein the coating comprisesan atomic layer deposition (ALD) conformally deposited metallic layer ordielectric layer disposed over the entirety of the polymer regions andthe tops of the waveguide.

Item 58: The waveguide device of Item 53, wherein the coating comprisesan atomic layer deposition (ALD) deposited metallic layer or dielectriclayer disposed over one or more facets of the polymer regions includingone or more of the upper, lower, or sidewall facets of the polymerregions.

Item 59: The waveguide device of Item 53, wherein a passivation coatingis applied to the surfaces of the polymer grating structure and/or thecoating.

Item 60: The waveguide device of Item 53, wherein the polymer regionsinclude a slant angle with respect to the waveguide.

Item 61: The waveguide device of Item 53, wherein the polymer gratingstructure further comprises an isotropic material between adjacentportions of the polymer network, wherein the isotropic material has arefractive index higher or lower than the refractive index of thepolymer network.

Item 62: The waveguide device of Item 61, wherein the isotropic materialoccupies a space at a bottom portion of the space between adjacentportions of the polymer network and the air occupies the space fromabove the top surface of the isotropic material to the modulation depth.

Item 63: The waveguide device of Item 61, wherein the isotropic materialcomprises a birefringent crystal material.

Item 64: The waveguide device of Item 63, wherein the birefringentcrystal material comprises a liquid crystal material.

Item 65: The waveguide device of Item 53, wherein the polymer gratingstructure has a modulation depth greater than a wavelength of visiblelight.

Item 66: The waveguide device of Item 53, wherein the polymer gratingstructure comprises a modulation depth and a grating pitch and whereinthe modulation depth is greater than the grating pitch.

Item 67: The waveguide device of Item 53, wherein the waveguidecomprises two substrates and the polymer grating structure is eithersandwiched between the two substrates or positioned on an externalsurface of either substrate.

Item 68: The waveguide device of Item 53, wherein the Bragg fringespacing of the polymer network is 0.35 μm to 0.8 μm and the gratingdepth of the polymer network is 1 μm to 3 μm.

Item 69: The waveguide device of Item 53, wherein the ratio of gratingdepth of the polymer network to the Bragg fringe spacing is 1:1 to 5:1.

Item 70: The waveguide device of Item 53, further comprising a picturegenerating unit, and wherein the polymer grating structure comprises awaveguide diffraction grating.

Item 71: The waveguide device of Item 70, wherein the waveguidediffraction grating is configured as a multiplexing grating.

Item 72: The waveguide device of Item 71, wherein the waveguidediffraction grating is configured to accept light from the picturegenerating unit which includes multiple images.

Item 73: The waveguide device of Item 70, wherein the waveguidediffraction grating is configured to outcouple light from the waveguide.

Item 74: The waveguide device of Item 70, wherein the waveguidediffraction grating is configured as a beam expander.

Item 75: The waveguide device of Item 70, wherein the waveguidediffraction grating is configured to incouple light including image datagenerated from the picture generating unit.

Item 76: The waveguide device of Item 75, wherein the waveguidediffraction grating is further configured to incouple S-polarized lightwith a high degree of efficiency.

Item 77: The waveguide device of Item 76, wherein the diffractiongrating is further configured to incouple S-polarized light at anefficiency of 70% to 95% at a Bragg angle.

Item 78. The waveguide device of Item 76, wherein the diffractiongrating is further configured to incouple P-polarized light at anefficiency of 25% to 50% at a Bragg angle.

Item 79: The waveguide device of Item 53, wherein the refractive indexdifference between the polymer network and the air gaps is 0.25 to 0.4.

Item 80: The waveguide device of Item 63, wherein the refractive indexdifference between the polymer network and the birefringent crystalmaterial is 0.05 to 0.2.

Item 81: The waveguide device of Item 53, wherein the polymer gratingstructure comprises a two-dimensional lattice structure or athree-dimensional lattice structure.

Item 82: The waveguide device of Item 53, further comprising anothergrating structure.

Item 83: The waveguide device of Item 82, wherein the polymer gratingstructure comprises an incoupling grating and the other gratingstructure comprises a beam expander or an outcoupling grating.

Item 84: A waveguide device comprising:

a waveguide supporting a polymer grating structure for diffracting lightpropagating in total internal reflection in said waveguide,

wherein the polymer grating structure comprises:

-   -   a polymer regions;    -   air gaps between adjacent portions of the polymer regions;    -   an optical layer disposed between the polymer regions and the        waveguide; and    -   a coating disposed on the tops of the polymer regions and the        tops of the optical layer.

Item 85: The waveguide device of Item 84, wherein the coating comprisesan atomic layer deposition (ALD) deposited metallic layer or dielectriclayer to enhance evanescent coupling between the waveguide and thepolymer grating structure.

Item 86: The waveguide device of Item 84, wherein the coating comprisesan atomic layer deposition (ALD) deposited metallic layer or dielectriclayer to enhance the effective refractive index of the polymer gratingstructure.

Item 87: The waveguide device of Item 84, wherein the coating comprisesan atomic layer deposition (ALD) deposited metallic layer or dielectriclayer to enhance adhesion and/or perform as a bias layer.

Item 88: The waveguide device of Item 84, wherein the coating comprisesan atomic layer deposition (ALD) conformally deposited metallic layer ordielectric layer disposed over the entirety of the polymer regions andthe exposed tops of the optical layer.

Item 89: The waveguide device of Item 84, wherein the coating comprisesan atomic layer deposition (ALD) deposited metallic layer or dielectriclayer disposed over one or more facets of the polymer regions includingone or more of the upper, lower, or sidewall facets of the polymerregions.

Item 90: The waveguide device of Item 84, wherein a passivation coatingis applied to the surfaces of the polymer grating structure.

Item 91: The waveguide device of Item 84, wherein the polymer regionsinclude a slant angle with respect to the waveguide.

Item 92: The waveguide device of Item 84, wherein the thickness ofoptical layer is designed to selectively modify diffraction efficiencyvs angle characteristics within a defined angular range.

Item 93: The waveguide device of Item 84, wherein the polymer gratingstructure further comprises an isotropic material between adjacentportions of the polymer network, wherein the isotropic material has arefractive index higher or lower than the refractive index of thepolymer network.

Item 94: The waveguide device of Item 93, wherein the isotropic materialoccupies a space at a bottom portion of the space between adjacentportions of the polymer network and the air occupies the space fromabove the top surface of the isotropic material to the modulation depth.

Item 95: The waveguide device of Item 93, wherein the isotropic materialcomprises a birefringent crystal material.

Item 96: The waveguide device of Item 95, wherein the birefringentcrystal material comprises a liquid crystal material.

Item 97: The waveguide device of Item 84, wherein the polymer gratingstructure has a modulation depth greater than a wavelength of visiblelight.

Item 98: The waveguide device of Item 84, wherein the polymer gratingstructure comprises a modulation depth and a grating pitch and whereinthe modulation depth is greater than the grating pitch.

Item 99: The waveguide device of Item 84, wherein the waveguidecomprises two substrates and the polymer grating structure is eithersandwiched between the two substrates or positioned on an externalsurface of either substrate.

Item 100: The waveguide device of Item 84, wherein the Bragg fringespacing of the polymer network is 0.35 μm to 0.8 μm and the gratingdepth of the polymer network is 1 μm to 3 μm.

Item 101: The waveguide device of Item 84, wherein the ratio of gratingdepth of the polymer network to the Bragg fringe spacing is 1:1 to 5:1.

Item 102: The waveguide device of Item 84, further comprising a picturegenerating unit, and wherein the polymer grating structure comprises awaveguide diffraction grating.

Item 103: The waveguide device of Item 102, wherein the waveguidediffraction grating is configured as a multiplexing grating.

Item 104: The waveguide device of Item 103, wherein the waveguidediffraction grating is configured to accept light from the picturegenerating unit which includes multiple images.

Item 105: The waveguide device of Item 104, wherein the waveguidediffraction grating is configured to outcouple light from the waveguide.

Item 106: The waveguide device of Item 102, wherein the waveguidediffraction grating is configured as a beam expander.

Item 107: The waveguide device of Item 102, wherein the waveguidediffraction grating is configured to incouple light including image datagenerated from the picture generating unit.

Item 108: The waveguide device of Item 107, wherein the waveguidediffraction grating is further configured to incouple S-polarized lightwith a high degree of efficiency.

Item 109: The waveguide device of Item 108, wherein the diffractiongrating is further configured to incouple S-polarized light at anefficiency of 70% to 95% at a Bragg angle.

Item 110: The waveguide device of Item 108, wherein the diffractiongrating is further configured to incouple P-polarized light at anefficiency of 25% to 50% at a Bragg angle.

Item 111: The waveguide device of Item 84, wherein the refractive indexdifference between the polymer network and the air gaps is 0.25 to 0.4.

Item 112: The waveguide device of Item 95, wherein the refractive indexdifference between the polymer network and the birefringent crystalmaterial is 0.05 to 0.2.

Item 113: The waveguide device of Item 84, wherein the polymer gratingstructure comprises a two-dimensional lattice structure or athree-dimensional lattice structure.

Item 114: The waveguide device of Item 84, further comprising anothergrating structure.

Item 115: The waveguide device of Item 114, wherein the polymer gratingstructure comprises an incoupling grating and the other gratingstructure comprises a beam expander or an outcoupling grating.

Item 116: A waveguide device comprising:

a waveguide supporting a polymer grating structure for diffracting lightpropagating in total internal reflection in said waveguide,

wherein the polymer grating structure comprises:

-   -   a polymer regions;    -   air gaps between adjacent portions of the polymer regions; and    -   an optical layer disposed between the polymer regions and the        waveguide.

Item 117: The waveguide device of Item 116, wherein the thickness ofoptical layer is designed to selectively modify diffraction efficiencyvs angle characteristics within a defined angular range.

Item 118: The waveguide device of Item 116, wherein the polymer gratingstructure further comprises an isotropic material between adjacentportions of the polymer network, wherein the isotropic material has arefractive index higher or lower than the refractive index of thepolymer network.

Item 119: The waveguide device of Item 118, wherein the isotropicmaterial occupies a space at a bottom portion of the space betweenadjacent portions of the polymer network and the air occupies the spacefrom above the top surface of the isotropic material to the modulationdepth.

Item 120: The waveguide device of Item 118, wherein the isotropicmaterial comprises a birefringent crystal material.

Item 121: The waveguide device of Item 120, wherein the birefringentcrystal material comprises a liquid crystal material.

Item 122: The waveguide device of Item 118, wherein the polymer gratingstructure has a modulation depth greater than a wavelength of visiblelight.

Item 123: The waveguide device of Item 118, wherein the polymer gratingstructure comprises a modulation depth and a grating pitch and whereinthe modulation depth is greater than the grating pitch.

Item 124: The waveguide device of Item 118, wherein the waveguidecomprises two substrates and the polymer grating structure is eithersandwiched between the two substrates or positioned on an externalsurface of either substrate.

Item 125: The waveguide device of Item 118, wherein the Bragg fringespacing of the polymer network is 0.35 μm to 0.8 μm and the gratingdepth of the polymer network is 1 μm to 3 μm.

Item 126: The waveguide device of Item 118, wherein the ratio of gratingdepth of the polymer network to the Bragg fringe spacing is 1:1 to 5:1.

Item 127: The waveguide device of Item 118, further comprising a picturegenerating unit, and wherein the polymer grating structure comprises awaveguide diffraction grating.

Item 128: The waveguide device of Item 127, wherein the waveguidediffraction grating is configured as a multiplexing grating.

Item 129: The waveguide device of Item 128, wherein the waveguidediffraction grating is configured to accept light from the picturegenerating unit which includes multiple images.

Item 130: The waveguide device of Item 127, wherein the waveguidediffraction grating is configured to outcouple light from the waveguide.

Item 131: The waveguide device of Item 130, wherein the waveguidediffraction grating is configured as a beam expander.

Item 132: The waveguide device of Item 127, wherein the waveguidediffraction grating is configured to incouple light including image datagenerated from the picture generating unit.

Item 133: The waveguide device of Item 132, wherein the waveguidediffraction grating is further configured to incouple S-polarized lightwith a high degree of efficiency.

Item 134: The waveguide device of Item 133, wherein the diffractiongrating is further configured to incouple S-polarized light at anefficiency of 70% to 95% at a Bragg angle.

Item 135: The waveguide device of Item 133, wherein the diffractiongrating is further configured to incouple P-polarized light at anefficiency of 25% to 50% at a Bragg angle.

Item 136: The waveguide device of Item 116, wherein the refractive indexdifference between the polymer network and the air gaps is 0.25 to 0.4.

Item 137: The waveguide device of Item 120, wherein the refractive indexdifference between the polymer network and the birefringent crystalmaterial is 0.05 to 0.2.

Item 138: The waveguide device of Item 116, wherein the polymer gratingstructure comprises a two-dimensional lattice structure or athree-dimensional lattice structure.

Item 139: The waveguide device of Item 116, further comprising anothergrating structure.

Item 140: The waveguide device of Item 139, wherein the polymer gratingstructure comprises an incoupling grating and the other gratingstructure comprises a beam expander or an outcoupling grating.

Item 141: The waveguide device of Item 116, wherein the optical issandwiched by the waveguide and the polymer grating structure andwherein the polymer grating structure extends all the way to the opticallayer to directly contact the optical layer.

Item 142: A waveguide device comprising:

a waveguide supporting a polymer grating structure for diffracting lightpropagating in total internal reflection in said waveguide,

wherein the polymer grating structure comprises:

-   -   a polymer regions; and    -   air gaps between adjacent portions of the polymer regions,    -   wherein the polymer regions and air gaps directly contact the        waveguide.

Item 143: The waveguide device of Item 142, wherein the thickness ofoptical layer is designed to selectively modify diffraction efficiencyvs angle characteristics within a defined angular range.

Item 144: The waveguide device of Item 142, wherein the polymer surfacerelief grating extends all the way to directly contact the waveguide.

Item 145. The waveguide device of claim 142, wherein there is no biaslayer between the polymer surface relief grating and the substrate.

Item 146: The waveguide device of Item 142, wherein the polymer gratingstructure further comprises an isotropic material between adjacentportions of the polymer network, wherein the isotropic material has arefractive index higher or lower than the refractive index of thepolymer network.

Item 147: The waveguide device of Item 146, wherein the isotropicmaterial occupies a space at a bottom portion of the space betweenadjacent portions of the polymer network and the air occupies the spacefrom above the top surface of the isotropic material to the modulationdepth.

Item 148: The waveguide device of Item 146, wherein the isotropicmaterial comprises a birefringent crystal material.

Item 149: The waveguide device of Item 148, wherein the birefringentcrystal material comprises a liquid crystal material.

Item 150: The waveguide device of Item 142, wherein the polymer gratingstructure has a modulation depth greater than a wavelength of visiblelight.

Item 151: The waveguide device of Item 142, wherein the polymer gratingstructure comprises a modulation depth and a grating pitch and whereinthe modulation depth is greater than the grating pitch.

Item 152: The waveguide device of Item 142, wherein the waveguidecomprises two substrates and the polymer grating structure is eithersandwiched between the two substrates or positioned on an externalsurface of either substrate.

Item 153: The waveguide device of Item 142, wherein the Bragg fringespacing of the polymer network is 0.35 μm to 0.8 μm and the gratingdepth of the polymer network is 1 μm to 3 μm.

Item 154: The waveguide device of Item 142, wherein the ratio of gratingdepth of the polymer network to the Bragg fringe spacing is 1:1 to 5:1.

Item 155: The waveguide device of Item 142, further comprising a picturegenerating unit, and wherein the polymer grating structure comprises awaveguide diffraction grating.

Item 156: The waveguide device of Item 155, wherein the waveguidediffraction grating is configured as a multiplexing grating.

Item 157: The waveguide device of Item 156, wherein the waveguidediffraction grating is configured to accept light from the picturegenerating unit which includes multiple images.

Item 158: The waveguide device of Item 155, wherein the waveguidediffraction grating is configured to outcouple light from the waveguide.

Item 159: The waveguide device of Item 155, wherein the waveguidediffraction grating is configured as a beam expander.

Item 160: The waveguide device of Item 155, wherein the waveguidediffraction grating is configured to incouple light including image datagenerated from the picture generating unit.

Item 161: The waveguide device of Item 160, wherein the waveguidediffraction grating is further configured to incouple S-polarized lightwith a high degree of efficiency.

Item 162: The waveguide device of Item 160, wherein the waveguidediffraction grating is further configured to incouple S-polarized lightat an efficiency of 70% to 95% at a Bragg angle.

Item 163: The waveguide device of Item 160, wherein the diffractiongrating is further configured to incouple P-polarized light at anefficiency of 25% to 50% at a Bragg angle.

Item 164: The waveguide device of Item 142, wherein the refractive indexdifference between the polymer network and the air gaps is 0.25 to 0.4.

Item 165: The waveguide device of Item 164, wherein the refractive indexdifference between the polymer network and the birefringent crystalmaterial is 0.05 to 0.2.

Item 166: The waveguide device of Item 142, wherein the polymer gratingstructure comprises a two-dimensional lattice structure or athree-dimensional lattice structure.

Item 167: The waveguide device of Item 142, further comprising anothergrating structure.

Item 168: The waveguide device of Item 167, wherein the polymer gratingstructure comprises an incoupling grating and the other gratingstructure comprises a beam expander or an outcoupling grating.

Item 169. A method for fabricating a grating, the method comprising:

providing a mixture of monomer and a nonreactive material;

providing a substrate;

coating a layer of the mixture on a surface of the substrate;

applying holographic recording beams to the layer to form a holographicpolymer dispersed grating comprising alternating polymer rich regionsand nonreactive material rich regions;

removing at least a portion of the nonreactive material in thenonreactive material rich regions to form a polymer surface reliefgrating including alternating polymer regions and air regions; and

applying a coating to the top surfaces of the polymer regions and thetop surfaces of the substrate in the air regions.

Item 170: The method of Item 169, wherein applying the coating comprisesan atomic layer deposition (ALD) process.

Item 171: The method of Item 169, wherein the coating comprises TiO₂ orZnO₂.

Item 172: The method of Item 169, wherein the monomer comprisesacrylates, methacrylates, vinyls, isocyanates, thiols,isocyanate-acrylate, and/or thiolene.

Item 173: The method of Item 172, wherein the mixture further comprisesat least one of a photoinitiator, a coinitiator, or additionaladditives.

Item 174: The method of Item 172, wherein the thiols comprisethiol-vinyl-acrylate.

Item 175: The method of Item 173, wherein the photoinitiator comprisesphotosensitive components.

Item 176: The method of Item 175, wherein the photosensitive componentscomprise dyes and/or radical generators.

Item 177: The method of Item 169, wherein providing a mixture of monomerand liquid crystal comprises:

mixing the monomer, liquid crystal, and at least one of aphotoinitiator, a coinitiator, multifunctional thiol, or additionaladditives;

storing the mixture in a location absent of light at a temperature of22° C. or less;

adding additional monomer;

filtering the mixture through a filter of 0.6 μm or less; and

storing the filtered mixture in a location absent of light.

Item 178: The method of Item 169, wherein the substrate comprises aglass substrate or plastic substrate.

Item 179: The method of Item 169, wherein the substrate comprises atransparent substrate.

Item 180: The method of Item 169, further comprising sandwiching themixture between the substrate and another substrate with one or morespacers for maintaining internal dimensions.

Item 181: The method of Item 180, further comprising applying anon-stick release layer on one surface of the other substrate.

Item 182: The method of Item 181, wherein the non-stick release layercomprises a fluoropolymer.

Item 183: The method of Item 169, further comprising refilling theliquid crystal rich regions with a liquid crystal material.

Item 184: The method of Item 183, wherein the liquid crystal materialhas a different molecular structure than the previously removed liquidcrystal.

Item 185: The method of Item 169, wherein removing at least a portion ofthe liquid crystal comprises removing substantially all of the liquidcrystal in the liquid crystal rich regions.

Item 186: The method of Item 169, wherein removing at least a portion ofthe liquid crystal further comprises leaving at least a portion of theliquid crystal in the polymer rich regions.

Item 187: The method of Item 169, further comprising applying aprotective layer over the deep SRG.

Item 188: The method of Item 187, wherein the protective layer comprisesan anti-reflective layer.

Item 189: The method of Item 187, wherein the protective layer comprisessilicate or silicon nitride.

Item 190: The method of Item 187, wherein applying a protective layercomprises depositing the protective layer on the deep SRG.

Item 191: The method of Item 190, wherein depositing the protectivelayer comprises chemical vapor deposition.

Item 192: The method of Item 191, wherein the chemical vapor depositionis a nanocoating process.

Item 193: The method of Item 190, wherein the protective layer comprisesa parylene coating.

Item 194: The method of Item 169, wherein the liquid crystal richregions comprise air gaps after removing at least a portion of theliquid crystal in the liquid crystal rich regions.

Item 195: The method of Item 194, further comprising creating a vacuumin the air gaps or filling the air gaps with an inert gas.

Item 196: The method of Item 169, wherein removing at least a portion ofliquid crystal comprises washing the holographic polymer dispersedliquid crystal grating with a solvent.

Item 197: The method of Item 196, wherein washing the holographicpolymer dispersed liquid crystal grating comprises immersing theholographic polymer dispersed liquid crystal grating in the solvent.

Item 198: The method of Item 196, wherein the solvent comprisesisopropyl alcohol.

Item 199: The method of Item 196, wherein the solvent is kept at atemperature lower than room temperature while washing the holographicpolymer dispersed liquid crystal grating.

Item 200: The method of Item 196, wherein removing at least a portion ofthe liquid crystal further comprises drying the holographic polymerdispersed liquid crystal grating with a high flow air source.

Item 201: The method of Item 169, further comprising curing theholographic polymer dispersed liquid crystal grating.

Item 202: The method of Item 201, wherein curing the holographic polymerdispersed liquid crystal grating comprises exposing the holographicpolymer dispersed liquid crystal grating to a low intensity white lightfor a period of about an hour.

Item 203: The method of Item 169, wherein the polymer surface reliefgrating is configured to incouple S-polarized light at an efficiency of70% to 95%.

Item 204: The method of Item 203, wherein the polymer surface reliefgrating is further configured to incouple P-polarized light at anefficiency of 25% to 50%.

Item 205: The method of Item 169, wherein the refractive indexdifference between the polymer network and the air gaps is 0.25 to 0.4.

Item 206: The method of Item 183, wherein the refractive indexdifference between the polymer network and the liquid crystal materialis 0.05 to 0.2.

Item 207: The method of Item 169, wherein the polymer surface reliefgrating comprises a Bragg fringe spacing of 0.35 μm to 0.8 μm and thegrating depth of 1 μm to 3 μm.

Item 208: The method of Item 169, wherein the polymer surface reliefgrating comprises a ratio of Bragg fringe spacing to grating depth of1:1 to 5:1.

Item 209: The method of Item 169, wherein the liquid crystal content inthe mixture of monomer and liquid crystal is approximately 20% to 50%.

Item 210: The method of Item 169, wherein the liquid crystal in themixture of monomer and liquid crystal comprises liquid crystal singles.

Item 211: The method of Item 210, wherein the liquid crystal singlescomprise cyanobiphenyl and/or pentylcyanobiphenyl.

Item 212: A method for fabricating a grating, the method comprising:

providing a mixture of monomer and a nonreactive material;

providing a substrate;

coating a layer of the mixture on a surface of the substrate;

applying holographic recording beams to the layer to form a holographicpolymer dispersed grating comprising alternating polymer rich regionsand nonreactive material rich regions;

removing at least a portion of the nonreactive material in thenonreactive material rich regions to form a polymer surface reliefgrating including alternating polymer regions and air regions, whereinan optical layer is disposed between the polymer regions and thesubstrate; and

applying a coating to the top surfaces of the polymer regions and thetop surfaces of the optical layer in the air regions.

Item 213: The method of Item 212, wherein applying the coating comprisesan atomic layer deposition (ALD) process.

Item 214: The method of Item 212, wherein the coating comprises TiO₂ orZnO₂.

Item 215: The method of Item 212, wherein the monomer comprisesacrylates, methacrylates, vinyls, isocyanates, thiols,isocyanate-acrylate, and/or thiolene.

Item 216: The method of Item 215, wherein the mixture further comprisesat least one of a photoinitiator, a coinitiator, or additionaladditives.

Item 217: The method of Item 215, wherein the thiols comprisethiol-vinyl-acrylate.

Item 218: The method of Item 216, wherein the photoinitiator comprisesphotosensitive components.

Item 219: The method of Item 218, wherein the photosensitive componentscomprise dyes and/or radical generators.

Item 220: The method of Item 212, wherein providing a mixture of monomerand liquid crystal comprises:

mixing the monomer, liquid crystal, and at least one of aphotoinitiator, a coinitiator, multifunctional thiol, or additionaladditives;

storing the mixture in a location absent of light at a temperature of22° C. or less;

adding additional monomer;

filtering the mixture through a filter of 0.6 μm or less; and

storing the filtered mixture in a location absent of light.

Item 221: The method of Item 212, wherein the substrate comprises aglass substrate or plastic substrate.

Item 222: The method of Item 212, wherein the substrate comprises atransparent substrate.

Item 223: The method of Item 212, further comprising sandwiching themixture between the substrate and another substrate with one or morespacers for maintaining internal dimensions.

Item 224: The method of Item 223, further comprising applying anon-stick release layer on one surface of the other substrate.

Item 225: The method of Item 224, wherein the non-stick release layercomprises a fluoropolymer.

Item 226: The method of Item 212, further comprising refilling theliquid crystal rich regions with a liquid crystal material.

Item 227: The method of Item 226, wherein the liquid crystal materialhas a different molecular structure than the previously removed liquidcrystal.

Item 228: The method of Item 212, wherein removing at least a portion ofthe liquid crystal comprises removing substantially all of the liquidcrystal in the liquid crystal rich regions.

Item 229: The method of Item 212, wherein removing at least a portion ofthe liquid crystal further comprises leaving at least a portion of theliquid crystal in the polymer rich regions.

Item 230: The method of Item 212, further comprising applying aprotective layer over the deep SRG.

Item 231: The method of Item 230, wherein the protective layer comprisesan anti-reflective layer.

Item 232: The method of Item 230, wherein the protective layer comprisessilicate or silicon nitride.

Item 233: The method of Item 230, wherein applying a protective layercomprises depositing the protective layer on the deep SRG.

Item 234: The method of Item 233, wherein depositing the protectivelayer comprises chemical vapor deposition.

Item 235: The method of Item 234, wherein the chemical vapor depositionis a nanocoating process.

Item 236: The method of Item 230, wherein the protective layer comprisesa parylene coating.

Item 237: The method of Item 212, wherein the liquid crystal richregions comprise air gaps after removing at least a portion of theliquid crystal in the liquid crystal rich regions.

Item 238: The method of Item 237, further comprising creating a vacuumin the air gaps or filling the air gaps with an inert gas.

Item 239: The method of Item 212, wherein removing at least a portion ofliquid crystal comprises washing the holographic polymer dispersedliquid crystal grating with a solvent.

Item 240: The method of Item 239, wherein washing the holographicpolymer dispersed liquid crystal grating comprises immersing theholographic polymer dispersed liquid crystal grating in the solvent.

Item 241: The method of Item 239, wherein the solvent comprisesisopropyl alcohol.

Item 242: The method of Item 239, wherein the solvent is kept at atemperature lower than room temperature while washing the holographicpolymer dispersed liquid crystal grating.

Item 243: The method of Item 239, wherein removing at least a portion ofthe liquid crystal further comprises drying the holographic polymerdispersed liquid crystal grating with a high flow air source.

Item 244: The method of Item 212, further comprising curing theholographic polymer dispersed liquid crystal grating.

Item 245: The method of Item 244, wherein curing the holographic polymerdispersed liquid crystal grating comprises exposing the holographicpolymer dispersed liquid crystal grating to a low intensity white lightfor a period of about an hour.

Item 246: The method of Item 212, wherein the polymer surface reliefgrating is configured to incouple S-polarized light at an efficiency of70% to 95%.

Item 247: The method of Item 246, wherein the polymer surface reliefgrating is further configured to incouple P-polarized light at anefficiency of 25% to 50%.

Item 248: The method of Item 212, wherein the refractive indexdifference between the polymer network and the air gaps is 0.25 to 0.4.

Item 249: The method of Item 226, wherein the refractive indexdifference between the polymer network and the liquid crystal materialis 0.05 to 0.2.

Item 250: The method of Item 212, wherein the polymer surface reliefgrating comprises a Bragg fringe spacing of 0.35 μm to 0.8 μm and thegrating depth of 1 μm to 3 μm.

Item 251: The method of Item 212, wherein the polymer surface reliefgrating comprises a ratio of Bragg fringe spacing to grating depth of1:1 to 5:1.

Item 252: The method of Item 212, wherein the liquid crystal content inthe mixture of monomer and liquid crystal is approximately 20% to 50%.

Item 253: The method of Item 212, wherein the liquid crystal in themixture of monomer and liquid crystal comprises liquid crystal singles.

Item 254: The method of Item 253, wherein the liquid crystal singlescomprise cyanobiphenyl and/or pentylcyanobiphenyl.

Item 255: A method for fabricating a grating, the method comprising:

providing a mixture of monomer and a nonreactive material;

providing a substrate;

coating a layer of the mixture on a surface of the substrate;

applying holographic recording beams to the layer to form a holographicpolymer dispersed grating comprising alternating polymer rich regionsand nonreactive material rich regions;

removing at least a portion of the nonreactive material in thenonreactive material rich regions to form a polymer surface reliefgrating including alternating polymer regions and air regions; and

performing a plasma ashing process to remove at least a portion ofpolymer from the polymer regions.

Item 256: The method of Item 255, wherein the mixture contains chemicaladditives for enhancing the effectiveness of the plasma ashing process.

Item 257: The method of Item 256, wherein the plasma ashing processincludes reactive species including oxygen and the mixture includesnitrogen to control the plasma ashing rate.

Item 258: The method of Item 256, wherein the plasma ashing processincludes reactive species including oxygen, fluorine, and/or hydrogen.

Item 259: The method of Item 258, wherein the plasma ashing processincludes a plasma mixture of nitrogen and hydrogen.

Item 260: The method of Item 259, wherein the plasma mixture furtherincludes fluorine.

Item 261: The method of Item 255, wherein the monomer comprisesacrylates, methacrylates, vinyls, isocynates, thiols,isocyanate-acrylate, and/or thioline.

Item 262: The method of Item 261, wherein the mixture further comprisesat least one of a photoinitiator, a coinitiator, or additionaladditives.

Item 263: The method of Item 261, wherein the thiols comprisethiol-vinyl-acrylate.

Item 264: The method of Item 262, wherein the photoinitiator comprisesphotosensitive components.

Item 265: The method of Item 264, wherein the photosensitive componentscomprise dyes and/or radical generators.

Item 266: The method of Item 255, wherein providing a mixture of monomerand liquid crystal comprises:

mixing the monomer, liquid crystal, and at least one of aphotoinitiator, a coinitiator, multifunctional thiol, or additionaladditives;

storing the mixture in a location absent of light at a temperature of22° C. or less;

adding additional monomer;

filtering the mixture through a filter of 0.6 μm or less; and

storing the filtered mixture in a location absent of light.

Item 267: The method of Item 255, wherein the substrate comprises aglass substrate or plastic substrate.

Item 268: The method of Item 255, wherein the substrate comprises atransparent substrate.

Item 269: The method of Item 255, further comprising sandwiching themixture between the substrate and another substrate with one or morespacers for maintaining internal dimensions.

Item 270: The method of Item 265, further comprising applying anon-stick release layer on one surface of the other substrate.

Item 271: The method of Item 270, wherein the non-stick release layercomprises a fluoropolymer.

Item 272: The method of Item 255, further comprising refilling theliquid crystal rich regions with a liquid crystal material.

Item 273: The method of Item 272, wherein the liquid crystal materialhas a different molecular structure than the previously removed liquidcrystal.

Item 274: The method of Item 255, wherein removing at least a portion ofthe liquid crystal comprises removing substantially all of the liquidcrystal in the liquid crystal rich regions.

Item 275: The method of Item 255, wherein removing at least a portion ofthe liquid crystal further comprises leaving at least a portion of theliquid crystal in the polymer rich regions.

Item 276: The method of Item 255, further comprising applying aprotective layer over the deep SRG.

Item 277: The method of Item 276, wherein the protective layer comprisesan anti-reflective layer.

Item 278: The method of Item 276, wherein the protective layer comprisessilicate or silicon nitride.

Item 279: The method of Item 276, wherein applying a protective layercomprises depositing the protective layer on the deep SRG.

Item 280: The method of Item 279, wherein depositing the protectivelayer comprises chemical vapor deposition.

Item 281: The method of Item 280, wherein the chemical vapor depositionis a nanocoating process.

Item 282: The method of Item 276, wherein the protective layer comprisesa parylene coating.

Item 283: The method of Item 255, wherein the liquid crystal richregions comprise air gaps after removing at least a portion of theliquid crystal in the liquid crystal rich regions.

Item 284: The method of Item 283, further comprising creating a vacuumin the air gaps or filling the air gaps with an inert gas.

Item 285: The method of Item 254, wherein removing at least a portion ofliquid crystal comprises washing the holographic polymer dispersedliquid crystal grating with a solvent.

Item 286: The method of Item 285, wherein washing the holographicpolymer dispersed liquid crystal grating comprises immersing theholographic polymer dispersed liquid crystal grating in the solvent.

Item 287: The method of Item 285, wherein the solvent comprisesisopropyl alcohol.

Item 288: The method of Item 285, wherein the solvent is kept at atemperature lower than room temperature while washing the holographicpolymer dispersed liquid crystal grating.

Item 289: The method of Item 285, wherein removing at least a portion ofthe liquid crystal further comprises drying the holographic polymerdispersed liquid crystal grating with a high flow air source.

Item 290: The method of Item 255, further comprising curing theholographic polymer dispersed liquid crystal grating.

Item 291: The method of Item 290, wherein curing the holographic polymerdispersed liquid crystal grating comprises exposing the holographicpolymer dispersed liquid crystal grating to a low intensity white lightfor a period of about an hour.

Item 292: The method of Item 255, wherein the polymer surface reliefgrating is configured to incouple S-polarized light at an efficiency of70% to 95%.

Item 293: The method of Item 292, wherein the polymer surface reliefgrating is further configured to incouple P-polarized light at anefficiency of 25% to 50%.

Item 294: The method of Item 255, wherein the refractive indexdifference between the polymer network and the air gaps is 0.25 to 0.4.

Item 295: The method of Item 272, wherein the refractive indexdifference between the polymer network and the liquid crystal materialis 0.05 to 0.2.

Item 296: The method of Item 255, wherein the polymer surface reliefgrating comprises a Bragg fringe spacing of 0.35 μm to 0.8 μm and thegrating depth of 1 μm to 3 μm.

Item 297: The method of Item 255, wherein the polymer surface reliefgrating comprises a ratio of Bragg fringe spacing to grating depth of1:1 to 5:1.

Item 298: The method of Item 255, wherein the liquid crystal content inthe mixture of monomer and liquid crystal is approximately 20% to 50%.

Item 299: The method of Item 255, wherein the liquid crystal in themixture of monomer and liquid crystal comprises liquid crystal singles.

Item 300: The method of Item 299, wherein the liquid crystal singlescomprise cyanobiphenyl and/or pentylcynobiphenyl.

Item 301: The method of Item 255, for fabricating a grating, furthercomprising:

immersing the grating in a refractive material to fill the air regionsand voids in the polymer rich regions formed by removal of thenonreactive material to form alternating polymer regions and refractivematerial regions; and

removing the refractive material in the refractive material regions toleave alternating composite polymer and second nonreactive materialregions and air regions.

Item 302: The method of Item 301, wherein removing the refractivematerial in the refractive materials is performed using a plasma ashingprocess.

Item 303. A waveguide comprising:

an optical substrate supporting a polymer grating structure fordiffracting light propagating in total internal reflection in saidwaveguide,

wherein the polymer grating structure comprises:

-   -   a polymer regions;    -   air gaps between adjacent portions of the polymer regions,        wherein a portion of the polymer regions on the same level as        the air gaps along with the air gaps form a surface relief        grating; and    -   backfill material regions below the air gaps, wherein a portion        of the polymer regions on the same level as the backfill        material regions along with the backfill material regions form a        volume grating, and    -   wherein the polymer grating structure comprises a dual        interaction grating in which total internal reflection light        from the surface relief grating formed by the polymer grating        structure interacts with the volume grating formed by the        polymer grating structure to provide a first diffraction        efficiency versus angle characteristic and total internal        reflection light from an opposing face of the optical substrate        interacts with the volume grating formed by the polymer grating        structure to provide a second diffraction efficiency versus        angle characteristic.

Item 304: The waveguide of Item 303, wherein the polymer gratingstructure is a fold grating.

Item 305: The waveguide of Item 303, wherein grating depth of thepolymer grating structure is less than the fringe spacing of the polymergrating structure.

Item 306: The waveguide of Item 303, wherein grating depth of thepolymer grating structure is greater than the fringe spacing of thepolymer grating structure.

Item 307. The waveguide of Item 303, wherein total internal reflectionfrom the surface relief grating formed by the polymer grating structureoccurs when the reflected first order diffraction from the surfacerelief grating formed by the polymer grating structure has a diffractionangle equal to the TIR angle of the waveguide.

Item 308: The waveguide of Item 303, wherein the polymer gratingstructure provides no transmitted diffraction orders.

Item 309: The waveguide of Item 303, wherein the polymer gratingstructure is a photonic crystal.

Item 310: The waveguide of Item 303, wherein the polymer gratingstructure comprises a Raman Nath grating overlaying a Bragg grating,wherein the Raman Nath grating has the same grating period as the Bragggrating, and the minima of the Raman Nath grating overlays the minima ofthe Bragg grating.

Item 311. The waveguide of Item 303, wherein the polymer gratingstructure is a slanted grating.

Item 312: The waveguide of Item 303, wherein the polymer gratingstructure is an unslanted grating.

Item 313. The waveguide of Item 303, wherein the backfill materialregions have a refractive index different from that of the polymer richregions.

Item 314. The waveguide device of Item 313, wherein the air regions andthe polymer rich regions on the same level of the air regions comprise aRaman-Nath grating.

Item 315. The waveguide device of claim 314, wherein the backfilledmaterial regions and the polymer rich regions on the same level as thebackfilled material regions comprise a volume Bragg grating.

DOCTRINE OF EQUIVALENTS

While the above description contains many specific embodiments of theinvention, these should not be construed as limitations on the scope ofthe invention, but rather as an example of one embodiment thereof. It istherefore to be understood that the present invention may be practicedin ways other than specifically described, without departing from thescope and spirit of the present invention. Thus, embodiments of thepresent invention should be considered in all respects as illustrativeand not restrictive. Accordingly, the scope of the invention should bedetermined not by the embodiments illustrated, but by the appendedclaims and their equivalents.

What is claimed is:
 1. A waveguide device comprising: a waveguidesupporting a polymer grating structure for diffracting light propagatingin total internal reflection in said waveguide, wherein the polymergrating structure comprises: a polymer regions; air gaps betweenadjacent portions of the polymer regions; an optical layer disposedbetween the polymer regions and the waveguide; and a coating disposed onthe tops of the polymer regions and the tops of the optical layer. 2.The waveguide device of claim 1, wherein the coating comprises an atomiclayer deposition (ALD) deposited metallic layer or dielectric layer toenhance evanescent coupling between the waveguide and the polymergrating structure.
 3. The waveguide device of claim 1, wherein thecoating comprises an atomic layer deposition (ALD) deposited metalliclayer or dielectric layer to enhance the effective refractive index ofthe polymer grating structure.
 4. The waveguide device of claim 1,wherein the coating comprises an atomic layer deposition (ALD) depositedmetallic layer or dielectric layer to enhance adhesion and/or perform asa bias layer.
 5. The waveguide device of claim 1, wherein the coatingcomprises an atomic layer deposition (ALD) conformally depositedmetallic layer or dielectric layer disposed over the entirety of thepolymer regions and the exposed tops of the optical layer.
 6. Thewaveguide device of claim 1, wherein the coating comprises an atomiclayer deposition (ALD) deposited metallic layer or dielectric layerdisposed over one or more facets of the polymer regions including one ormore of the upper, lower, or sidewall facets of the polymer regions. 7.The waveguide device of claim 1, wherein a passivation coating isapplied to the surfaces of the polymer grating structure.
 8. Thewaveguide device of claim 1, wherein the polymer regions include a slantangle with respect to the waveguide.
 9. The waveguide device of claim 1,wherein the polymer grating structure further comprises an isotropicmaterial between adjacent portions of the polymer network, wherein theisotropic material has a refractive index higher or lower than therefractive index of the polymer network.
 10. The waveguide device ofclaim 9, wherein the isotropic material occupies a space at a bottomportion of the space between adjacent portions of the polymer networkand the air occupies the space from above the top surface of theisotropic material to the modulation depth.
 11. The waveguide device ofclaim 9, wherein the isotropic material comprises a birefringent crystalmaterial.
 12. The waveguide device of claim 11, wherein the birefringentcrystal material comprises a liquid crystal material.
 13. The waveguidedevice of claim 11, wherein the refractive index difference between thepolymer network and the birefringent crystal material is 0.05 to 0.2.14. The waveguide device of claim 1, wherein the polymer gratingstructure has a modulation depth greater than a wavelength of visiblelight.
 15. The waveguide device of claim 1, wherein the polymer gratingstructure comprises a modulation depth and a grating pitch and whereinthe modulation depth is greater than the grating pitch.
 16. Thewaveguide device of claim 1, wherein the waveguide comprises twosubstrates and the polymer grating structure is either sandwichedbetween the two substrates or positioned on an external surface ofeither substrate.
 17. The waveguide device of claim 1, wherein the Braggfringe spacing of the polymer network is 0.35 μm to 0.8 μm and thegrating depth of the polymer network is 1 μm to 3 μm.
 18. The waveguidedevice of claim 1, wherein the ratio of grating depth of the polymernetwork to the Bragg fringe spacing is 1:1 to 5:1.
 19. The waveguidedevice of claim 1, further comprising a picture generating unit, andwherein the polymer grating structure comprises a waveguide diffractiongrating.
 20. The waveguide device of claim 19, wherein the waveguidediffraction grating is configured as a multiplexing grating.
 21. Thewaveguide device of claim 20, wherein the waveguide diffraction gratingis configured to accept light from the picture generating unit whichincludes multiple images.
 22. The waveguide device of claim 21, whereinthe waveguide diffraction grating is configured to outcouple light fromthe waveguide.
 23. The waveguide device of claim 19, wherein thewaveguide diffraction grating is configured as a beam expander.
 24. Thewaveguide device of claim 19, wherein the waveguide diffraction gratingis configured to incouple light including image data generated from thepicture generating unit.
 25. The waveguide device of claim 24, whereinthe waveguide diffraction grating is further configured to incoupleS-polarized light with a high degree of efficiency.
 26. The waveguidedevice of claim 25, wherein the diffraction grating is furtherconfigured to incouple S-polarized light at an efficiency of 70% to 95%at a Bragg angle.
 27. The waveguide device of claim 25, wherein thediffraction grating is further configured to incouple P-polarized lightat an efficiency of 25% to 50% at a Bragg angle.
 28. The waveguidedevice of claim 1, wherein the refractive index difference between thepolymer network and the air gaps is 0.25 to 0.4.
 29. The waveguidedevice of claim 1, wherein the polymer grating structure comprises atwo-dimensional lattice structure or a three-dimensional latticestructure.
 30. The waveguide device of claim 1, further comprisinganother grating structure, wherein the polymer grating structurecomprises an incoupling grating and the other grating structurecomprises a beam expander or an outcoupling grating.